Handbook of Deposition Technologies for Films and Coatings 2010
DOI: 10.1016/b978-0-8155-2031-3.00009-0
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Plasma-Enhanced Chemical Vapor Deposition of Functional Coatings

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Cited by 48 publications
(48 citation statements)
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“…Alternatively, chemical reactions may be used by intend. They create a thin-film, for instance by the reaction of two precursors in gaseous state, representing a chemical vapor deposition (CVD) [1,[11][12][13][14]. PVD and CVD are dry processes, with a majority conducted under vacuum conditions.…”
Section: Introduction Into Depositionmentioning
confidence: 99%
“…Alternatively, chemical reactions may be used by intend. They create a thin-film, for instance by the reaction of two precursors in gaseous state, representing a chemical vapor deposition (CVD) [1,[11][12][13][14]. PVD and CVD are dry processes, with a majority conducted under vacuum conditions.…”
Section: Introduction Into Depositionmentioning
confidence: 99%
“…Again, due to the difference in temperature gradient of the steel substrate and carbon nitride film layer, thermal stress is induced at the interface [35]. These high compressive and thermal residual stresses tend to detach the film from the substrate after a critical film thickness.…”
Section: Hipims Deposition Processmentioning
confidence: 99%
“…The HiPIMS deposition process used in this experiment is a class of plasma-based sputtering process such as PECVD [34] in which gas phase chemistry is activated by using the energy from plasma discharge rather than using external thermal energy [35]. In reactive HiPIMS so-called impulses (unipolar pulses) containing high power are applied to the magnetron target at low duty cycle (0.5-5%) and at low pulse frequency (50 Hz to 5 kHz) while keeping the average power less than 2 orders of magnitude of the peak discharge power [36].…”
Section: Hipims Deposition Processmentioning
confidence: 99%
“…The two parts obtained are assembled through a thermo-mechanical process (s.c. "Punch press") and then grinded. Conventional surface treatments are completely replaced by the innovative Plasma-Enhanced Chemical Vapour Deposition (PECVD) treatment [33]. This is a process by which thin films of various materials can be deposited on substrates at lower temperature than that of standard Chemical Vapour Deposition (CVD).…”
Section: General Features and Aims Of The Proposed Eco-innovationmentioning
confidence: 99%