Plasma-Enabled ALD of Niobium Nitride Using an Organometallic Nb Precursor

Deguns, Eric; Sowa, Mark J.; Dalberth, Mark J.; Bhatia, Ritwik; Kanjolia, Ravi; Moser, Dan; Sundaram, Ganesh; Becker, Jill

doi:10.1149/1.3485254

Cited by 5 publications

(4 citation statements)

References 10 publications

(13 reference statements)

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“…Sowa [17] demonstrated that using TBTDEN and plasma N 2 /H 2 , the ALD window was not observed and an increase in GPC as a function of the substrate temperature was found. Hinz et al…”

Section: Ald Windowmentioning

confidence: 99%

“…shows that the density of the samples increased after annealing and S2 exhibited the highest density among all of the samples. existing information in previous studies on the ALD synthesis of NbN [14][15][16][17][18][19], the presence of carbon as an impurity in the classical ALD process could significantly impact the superconductivity. Therefore, the improvement of the Tc of our carbon-free samples after annealing is related to another parameter.…”

Section: Effect Of Annealing In Argonmentioning

confidence: 99%

“…Extremely interesting results (Tc: ~14 K for the ~30 nm thick film) have been reported using TBTDEN/H 2 [15,18] or TBTDEN/H 2 /N 2 [17,19]. Several authors [14,18] reported that the films may contain relatively high amounts of oxygen and carbon, up to 50 at%.…”

Section: Introductionmentioning

confidence: 96%

“…However, in this case, the nitrogen originates from the precursor and it is difficult to prevent carbon contamination in the films. In other cases, the TBTDEN is combined with N 2 [16] or H 2 /N 2 [17] plasma as the reducing agent to form NbN. Efforts have been focused on the evolution of film properties with the process parameters (plasma duration, temperature) and film thickness.…”

Section: Introductionmentioning

confidence: 99%

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Improved critical temperature of superconducting plasma-enhanced atomic layer deposition of niobium nitride thin films by thermal annealing

et al. 2020

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The efficiency of the superconducting radio frequency cavities composed of Nb required the deposition of thickness-controlled multilayer coatings of superconductor-insulator-superconductor (S-IS) on the internal surfaces of the cavities. Herein, we report the plasma-enhanced atomic layer deposition of carbon-free NbN (50 µm thick), followed by a thermal treatment, to obtain the superconducting layer in the S-IS structure. Using (tert-butylimido)-tris(diethylamino)-niobium as the niobium precursor and H 2 and NH 3 plasma as reactive gases, the deposition and annealing parameters were optimized by studying their effects on the film properties (crystallinity, density, and composition). We demonstrated that the superconducting critical temperature (Tc) can be improved after thermal annealing up to 13.8 K, a value compatible with the targeted application. In addition to the expected densified layers and increased grain size, we observed a partial transformation of the oxide present in the as-deposited layer into niobium oxynitride, which could indicate the origin of the improvement of the superconducting properties. With low carbon and oxygen impurity concentrations in the films, this study contributes to the understanding of the relationship between the structure, composition, and superconductivity in NbN.

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“…Sowa [17] demonstrated that using TBTDEN and plasma N 2 /H 2 , the ALD window was not observed and an increase in GPC as a function of the substrate temperature was found. Hinz et al…”

Section: Ald Windowmentioning

confidence: 99%