Plasma distribution of cathodic arc deposition systems

Abstract

The plasma distribution using a cathodic arc plasma source with and without magnetic macroparticle filter has been determined by depositing on a transparent plastic substrate and measuring the film absorption. It was found that the width of the distribution depends on the arc current, and it also depends on the cathode material which leads to a spatial separation of the elements when an alloy cathode is used. By applying a magnetic multicusp field near the exit of the magnetic filter, it was possible to modify the plasma distribution and obtain a flat plasma profile with a constant and homogeneous elemental distribution which was demonstrated by depositing FeNd thin films.

Layer formation by resputtering in Ti–Si–C hard coatings during large scale cathodic arc deposition

“…6a. This is apparently inconsistent with the reported elemental dependence of spatial plasma distribution at high angles discussed above [16,17]. Scaling with film thickness does not reverse this trend as Ti is still more prominent in the peak-flux region than in the region at high angles, see Fig.…”

“…In this region, high Si-content will promote a microstructure with small crystallites. Zone a, c) In the sideways regions, a & c, the exposure is to less dense plasma where the fraction of Ti could be higher, interpreting Anders et al [16]. As the ion incidence angle relative to the substrate normal increases, re-sputtering of primarily Si becomes more pronounced, coinciding with a decreased film growth rate.…”

“…Furthermore, even when collisions take place, plasma-gas reactions are unlikely unless energetically favorable [22]. Finally, as mentioned above, the knowledge on the directional arc-plasma distribution [16,17] does not indicate any preference for high-angle paths for Si. …”

“…The details of the profile depend on plasma source design and geometry. The spatial distribution of evaporated material in pulsed arc has been studied by S. Anders et al [16],, for different elemental cathodes. A tendency for broader distributions of elements with higher mass was found for metals in the range of 27 amu (Al) to 195 amu (Pt).…”

Electrical properties of a-C: Mo films produced by dual-cathode filtered cathodic arc plasma deposition

“…The cathodes are pulsed using the "triggerless" arc initiation method [13]. The streaming plasma was guided and transported through a curved magnetic macroparticle filter [14] into the magnetic plasma homogenizer [15,16] to deposit highquality films.…”