Plasma diagnostics and film growth of multicomponent nitride thin films with magnetic-field-assisted-dc magnetron sputtering

Rao, Smita G.; Shu, Rui; Boyd, Robert; Febvrier, Arnaud Le; Eklund, Per

doi:10.1016/j.vacuum.2022.111331

Cited by 6 publications

(4 citation statements)

References 26 publications

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“…Table I shows ion flux measured in three different sputtering systems, i.e. a DC magnetron, 37) a high-power impulse magnetron sputtering (HiPIMS), 38) and in the plasma source used in this work. These previous works on the DC magnetrons and the HiPIMS 37,38) have not reported the spatial profile of the ion flux, but the maximum value of its radial profile.…”

Section: Spatial Profiles Of the Ion Flux To The Substrate At Various...mentioning

confidence: 99%

“…a DC magnetron, 37) a high-power impulse magnetron sputtering (HiPIMS), 38) and in the plasma source used in this work. These previous works on the DC magnetrons and the HiPIMS 37,38) have not reported the spatial profile of the ion flux, but the maximum value of its radial profile. Comparing the ion flux in these sputtering systems is difficult because of the different experimental conditions.…”

Section: Spatial Profiles Of the Ion Flux To The Substrate At Various...mentioning

confidence: 99%

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Spatial structures of rf ring-shaped magnetized sputtering plasmas with two facing cylindrical ZnO/Al₂O₃ targets

Ohtsu

Hara

Imoto

et al. 2023

Jpn. J. Appl. Phys.

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Spatial structures of the ion flux to the substrate are measured in a rf ring-shaped magnetized sputtering plasma with two facing cylindrical ZnO/Al2O3 targets at various argon gas pressures of 0.13, 0.67 and 0.93 Pa. Spatial distributions of the Hall parameter and Larmor radius of electrons and ions are also discussed by using simulated values of the magnetic flux density. The magnitude of the ion flux for 0.13 and 0.67 Pa is of the order of 1020 m-2s-1, while for 0.93 Pa it is of the order of 1021 m-2s-1 at a fixed rf power of 20 W. The radial profile of the ion flux has a peak at the position of the ring-shaped groove near a rf electrode and then becomes uniform further away from the electrode at all gas pressures. It is found that the axial profile of the deviation from a uniform profile estimated from the radial profile of the ion flux has two decay characteristics (1st decay length of 13.9 - 17.5 mm and 2nd decay length of 52.6 - 66.7 mm) and their decay lengths decrease with increasing the gas pressure.

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Section: Spatial Profiles Of the Ion Flux To The Substrate At Various...mentioning

confidence: 99%

Section: Spatial Profiles Of the Ion Flux To The Substrate At Various...mentioning

confidence: 99%

Spatial structures of rf ring-shaped magnetized sputtering plasmas with two facing cylindrical ZnO/Al₂O₃ targets

Ohtsu

Hara

Imoto

et al. 2023

Jpn. J. Appl. Phys.

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“…[9,[35][36][37][38] Depending on the chosen method, a film thickness ranging from few nm up to mm can be obtained. Among the reports on thin film growth, magnetron sputtering from disc shaped targets appears to be by far the most commonly used method, see for example the recent work from Zandejas Medina et al [39,40] or by Rao et al [41,42] Magnetron sputtering is a very versatile technique which allows high deposition rates. Recently, we have carried out a study of the growth of CoCrFeNi by DC magnetron sputtering [43] in which we compared the chemical and structural properties of the films grown from two different targets.…”

Section: Introductionmentioning

confidence: 99%

“…[ 39,40 ] or by Rao et al. [ 41,42 ] Magnetron sputtering is a very versatile technique which allows high deposition rates. Recently, we have carried out a study of the growth of CoCrFeNi by DC magnetron sputtering [ 43 ] in which we compared the chemical and structural properties of the films grown from two different targets.…”

Section: Introductionmentioning

confidence: 99%

Fabrication of Single‐Crystalline CoCrFeNi Thin Films by DC Magnetron Sputtering: A Route to Surface Studies of High‐Entropy Alloys

et al. 2023

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High‐entropy alloys (HEAs) with their almost limitless number of possible compositions have raised widespread attention in material science. Next to wear and corrosion resistive coatings, their application as tunable electrocatalysts has recently moved into the focus. On the other hand, fundamental properties of HEA surfaces like atomic and electronic structure, surface segregation and diffusion as well as adsorption on HEA surfaces are barely explored. The lack of research is caused by the limited availability of single‐crystalline samples. In the present work, the epitaxial growth of face centered cubic (fcc) CoCrFeNi films on MgO(100) is reported. Their characterization by X‐ray diffraction (XRD), energy dispersive X‐ray spectroscopy (EDX), and transmission electron microscopy (TEM) demonstrates that the layers with a homogeneous and close to equimolar elemental composition are oriented in [100] direction and aligned with the substrate to which they form an abrupt interface. X‐ray photoelectron spectroscopy (XPS), low‐energy electron diffraction (LEED), and angle‐resolved photoelectron spectroscopy are employed to study chemical composition and atomic and electronic structure of CoCrFeNi(100). It is demonstrated that epitaxially grown HEA films have the potential to fill the sample gap, allowing for fundamental studies of properties of and processes on well‐defined HEA surfaces over the full compositional space.

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Enhanced Oxygen‐Reaction Electrocatalysis and Corrosion Resistance of CoCrFeNi Thin Films by Tuned Microstructure and Surface Oxidation

Linder,

Boyd,

Greczynski

et al. 2024

Small Science

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Oxygen electrocatalysts play a key role in renewable and fossil‐free energy production. Bifunctional catalysts active for oxygen reduction reaction (ORR) and oxygen evolution reaction (OER) allow use of the same material system for both energy production (ORR) and fuel generation (OER). However, optimizing the performance of bifunctional catalysts requires in depth understanding of the catalyst structure, its surface chemistry in terms of active sites and the underlying catalytic mechanism. Here, the catalytic performance of CoCrFeNi thin films is investigated, synthesized using high‐power impulse magnetron sputtering, as bifunctional oxygen electrocatalysts. The film crystal structure and morphology, and thereby the catalytic performance, can be tuned by the ion acceleration (bias) to the substrate. To further enhance the catalytic activity, anodization is used to electrochemically modify the films, forming a thicker oxide layer enriched in Co and Ni cations which significantly improves the ORR performance. Anodization improves the catalyst stability during OER, with an OER potential of 1.45 V versus the reversible hydrogen electrode (RHE) at 10 mA cm−2 for more than 24 h. While the corrosion resistance is high both before and after anodization, in terms of catalytic activity the anodized films outperformed the as‐deposited ones. This makes anodized films excellent electrocatalyst candidates in corrosive alkaline environments such as fuel cells and electrolyzers.

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Plasma diagnostics and film growth of multicomponent nitride thin films with magnetic-field-assisted-dc magnetron sputtering

Cited by 6 publications

References 26 publications

Spatial structures of rf ring-shaped magnetized sputtering plasmas with two facing cylindrical ZnO/Al₂O₃ targets

Spatial structures of rf ring-shaped magnetized sputtering plasmas with two facing cylindrical ZnO/Al₂O₃ targets

Fabrication of Single‐Crystalline CoCrFeNi Thin Films by DC Magnetron Sputtering: A Route to Surface Studies of High‐Entropy Alloys

Enhanced Oxygen‐Reaction Electrocatalysis and Corrosion Resistance of CoCrFeNi Thin Films by Tuned Microstructure and Surface Oxidation

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Plasma diagnostics and film growth of multicomponent nitride thin films with magnetic-field-assisted-dc magnetron sputtering

Cited by 6 publications

References 26 publications

Spatial structures of rf ring-shaped magnetized sputtering plasmas with two facing cylindrical ZnO/Al2O3 targets

Spatial structures of rf ring-shaped magnetized sputtering plasmas with two facing cylindrical ZnO/Al2O3 targets

Fabrication of Single‐Crystalline CoCrFeNi Thin Films by DC Magnetron Sputtering: A Route to Surface Studies of High‐Entropy Alloys

Enhanced Oxygen‐Reaction Electrocatalysis and Corrosion Resistance of CoCrFeNi Thin Films by Tuned Microstructure and Surface Oxidation

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Product

Resources

About

Spatial structures of rf ring-shaped magnetized sputtering plasmas with two facing cylindrical ZnO/Al₂O₃ targets

Spatial structures of rf ring-shaped magnetized sputtering plasmas with two facing cylindrical ZnO/Al₂O₃ targets