Abstract:Abstract. Two different methods of deposition of thin layers containing titanium and barium with the use of dielectric barrier discharge were investigated. The first was carried out in two stages. The first stage consisted in transferring compounds containing titanium and barium from the vapor of the organic precursor to the copper substrate, while the second stage involved the etching of the organic layer in oxygen. The second method consisted in transferring titanium and barium to the copper substrate from t… Show more
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