Plasma deposited silicon oxide films for controlled permeation of copper as antimicrobial agent

Lehmann, Antje; Rupf, Stefan; Schubert, Andreas; Zylla, Isabella-Maria; Seifert, Hans Jürgen; Schindler, Axel; Arnold, Thomas

doi:10.1016/j.cpme.2015.01.001

Cited by 3 publications

(6 citation statements)

References 24 publications

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“…Besides the displacement, there is a trend to gradually vanishment of this contribution as P is increased beyond 200 W, corroborating the idea of depletion of methyl groups and transformation of the organosilicon layer into silica. The same intensity reduction is observed in the band around 790 cm -1 with increasing P once this absorption may have the contribution of organic [Si-(CH 3 ) 2 ] 33 and inorganic (Si-O-Si) 54,58,67 groups.…”

Section: Chemical Structuresupporting

confidence: 65%

“…Studies in the literature 58,67,73,78,79 show that the content of SiO 4 groups affects the volumetric density of the material due to porosity creation 80 . Furthermore, samples with higher densities of tetrahedral oxide showed greater contribution of the band related to Si-OH (Figure 2a).…”

Section: Chemical Structurementioning

confidence: 99%

Section: Barrier Propertiesmentioning

confidence: 99%

“…Despite the inorganic film furnishes a better protection against corrosion than the organosilicon one, its physical stability is inferior 26,67,100 . Thus, the bilayers (organosilicon/SiO x ) may improve the barrier properties of the system by combining the good physical stability of the organosilicon with the good barrier of the oxide 67,100,101 . Although the sample exposed to the 100 W plasma also showed a high phase angle (70°), the drop in intermediate frequencies and the presence of a second well-defined time constant indicate penetration of the electrolyte and increase in electrolyte-substrate interactions.…”

Section: Barrier Propertiesmentioning

confidence: 99%

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Effect of Plasma Oxidation Treatment on Production of a SiOx/SiOxCyHz Bilayer to Protect Carbon Steel Against Corrosion

et al. 2021

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Because of its excellent properties, carbon steel is a material widely used in several sectors. However, it is easily corroded when exposed to the environment. Seeking to remedy this problem, the possibility of coating carbon steel with SiO x /SiO x C y H z films generated by deposition and oxidation in low-pressure plasmas was investigated. Specifically, the effects of excitation power of the oxidation plasma on layer thickness, chemical structure, elemental composition, and barrier properties of the obtained coatings were investigated. The coating of the steel with the SiO x C y H z film, generated by plasma in an atmosphere of hexamethyldisiloxane (HMDSO), increased the total resistance to the passage of electric current, measured by electrochemical impedance spectroscopy. However, under the condition of moderate power oxidation (50 W), the results point to the creation of a bilayer system with high resistance to electrochemical attack compared to the SiO x C y H z film, even though its thickness is less than this.

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Section: Chemical Structuresupporting

confidence: 65%

Section: Chemical Structurementioning

confidence: 99%

Section: Barrier Propertiesmentioning

confidence: 99%

Section: Barrier Propertiesmentioning

confidence: 99%

See 2 more Smart Citations

Effect of Plasma Oxidation Treatment on Production of a SiOx/SiOxCyHz Bilayer to Protect Carbon Steel Against Corrosion

et al. 2021

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“…31 The plasma-jet system employed for thin film deposition has been originally developed for atmospheric pressure plasma etching, where very high spatiotemporal stability of the plasma discharge is required. [32][33][34] High frequency power is used to ignite and sustain the plasma.…”

Section: Polymer Resist-related Ion Beam Techniquesmentioning

confidence: 99%

Finishing of metal optics by ion beam technologies

et al. 2019

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Ultraprecise mirror devices show considerable potential with view to applications in the visible and the ultraviolet spectral ranges. Aluminum alloys gather good mechanical and excellent optical properties and thus they emerge as important mirror construction materials. However, ultraprecision machining and polishing of optical aluminum surfaces are challenging, which originates from the high chemical reactivity and the heterogeneous matrix structure. Recently, several ion beam-based techniques have been developed to qualify aluminum mirrors for short-wavelength applications. We give an overview of the state-of-the-art ion beamprocessing techniques for figure error correction and planarization, either by direct aluminum machining or with the aid of polymer or inorganic, amorphous surface films.

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Effect of Plasma Excitation Power on the SiOxCyHz/TiOx Nanocomposite

2023

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Titanium dioxide has attracted a great deal of attention in the field of environmental purification due to its photocatalytic activity under ultraviolet light. Photocatalytic efficiency and the energy required to initiate the process remain the drawbacks that hinder the widespread adoption of the process. Consistently with this, it is proposed here the polymerization of hexamethyldisiloxane fragments simultaneously to TiO2 sputtering for the production of thin films in low-pressure plasma. The effect of plasma excitation power on the molecular structure and chemical composition of the films was evaluated by infrared spectroscopy. Wettability and surface energy were assessed by a sessile drop technique, using deionized water and diiodomethane. The morphology and elemental composition of the films were determined using scanning electron microscopy and energy dispersive spectroscopy, respectively. The thickness and roughness of the resulting films were measured using profilometry. Organosilicon-to-silica films, with different properties, were deposited by combining both deposition processes. Titanium was detected from the structures fabricated by the hybrid method. It has been observed that the proportion of titanium and particles incorporated into silicon-based matrices depends on the plasma excitation power. In general, a decrease in film thickness with increasing power has been observed. The presence of Ti in the plasma atmosphere alters the plasma deposition mechanism, affecting film deposition rate, roughness, and wettability. An interpretation of the excitation power dependence on the plasma activation level and sputtering yield is proposed. The methodology developed here will encourage researchers to create TiO2 films on a range of substrates for their prospective use as sensor electrodes, water and air purification systems, and biocompatible materials.

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Plasma deposited silicon oxide films for controlled permeation of copper as antimicrobial agent

Cited by 3 publications

References 24 publications

Effect of Plasma Oxidation Treatment on Production of a SiOx/SiOxCyHz Bilayer to Protect Carbon Steel Against Corrosion

Effect of Plasma Oxidation Treatment on Production of a SiOx/SiOxCyHz Bilayer to Protect Carbon Steel Against Corrosion

Finishing of metal optics by ion beam technologies

Effect of Plasma Excitation Power on the SiOxCyHz/TiOx Nanocomposite

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