2019
DOI: 10.1088/2053-1591/ab42b1
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Plasma CVD/etching of Poly(methyl methacrylate) surface: optical and structural characterizations

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Cited by 3 publications
(2 citation statements)
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“…This process causes a unique film deposition onto the substrate surface within the plasma reactor, known as plasma polymerization. Moreover, this technique is efficient, requiring only minimal amounts of precursor materials and consuming minimal energy (Saloum et al, 2019a;Saloum et al, 2019bSaloum et al, 2020aSaloum et al, 2020b).…”
Section: Introductionmentioning
confidence: 99%
“…This process causes a unique film deposition onto the substrate surface within the plasma reactor, known as plasma polymerization. Moreover, this technique is efficient, requiring only minimal amounts of precursor materials and consuming minimal energy (Saloum et al, 2019a;Saloum et al, 2019bSaloum et al, 2020aSaloum et al, 2020b).…”
Section: Introductionmentioning
confidence: 99%
“…Low‐pressure glow discharge plasma is well established as an attractive technique, which uses gases as reactants, to perform the surface modification of different materials such as polymers, in the purpose of altering some properties such as cross‐linking, wettability, roughness, and adhesion 1–5 . Gas discharges environments contain active simultaneously generated species such as electrons, ions, free radicals, molecular fragments, and electromagnetic radiations 6 ; these active species can modify the surface of polymers without affecting its bulk properties.…”
Section: Introductionmentioning
confidence: 99%