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2016
DOI: 10.1016/j.vacuum.2016.08.007
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Plasma-chemical synthesis of copper oxide nanoparticles in a low-pressure arc discharge

Abstract: Abstract. The influence of a pressure of gas mixture (10 vol% O 2 + 90% N 2 ) on an average size of copper oxide nanoparticles, produced in the plasma of low pressure arc discharge, has been studied as a basic process variable. A correlation between the dependence of average particle size on gas mixture pressure and the dependence of discharge gap voltage on product of interelectrode distance by a gas mixture pressure, has been found. The estimation was carried out by means of X-ray diffraction (XRD) and high-… Show more

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Cited by 48 publications
(19 citation statements)
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“…According to [3][4][5][6][7] It is known [9,16] that in CuO the exchange interaction is of the order of ~ 400 K, and the short-range ferromagnetic order can be remained up to high temperatures.…”
Section: Results and Analysismentioning
confidence: 99%
See 1 more Smart Citation
“…According to [3][4][5][6][7] It is known [9,16] that in CuO the exchange interaction is of the order of ~ 400 K, and the short-range ferromagnetic order can be remained up to high temperatures.…”
Section: Results and Analysismentioning
confidence: 99%
“…Thus, further study of the magnetic properties of the produced CuO nanopowders over a wide temperature range, is of current importance. To prevent the influence of magnetic impurities 2 and the phase inhomogeneity of CuO, there were undertaken the particular measures, described in detail in [3][4][5][6][7]. This behavior of CuO nanoparticles fundamentally differs from the properties of the "bulk analogue", in particular polycrystalline CuO [8][9][10][11][12][13].…”
Section: Introductionmentioning
confidence: 99%
“…CuO nanopowder synthesis was carried out in the plasma-chemical reactor. [6][7][8][9] An arc evaporator was used with the following characteristics: the pulsed arc discharge current of 2.3 kA and the intensity of a longitudinal magnetic field on the surface of the cathode, produced by the focusing coil, of 80 mT. A technological quality copper was chosen as a sputtering cathode.…”
Section: Methodsmentioning
confidence: 99%
“…2 представленa поверхность микрогранулы ВТСП с осаждeнным нанопорошком CuO. Особенности синтеза и основные свойства осаждаемого нанопорошка CuO подробно описаны в работах [12][13][14][15].…”
Section: результаты параметрических испытанийunclassified