Plasma chemical reactions in C2H2/N2, C2H4/N2, and C2H6/N2 gas mixtures of a laboratory dielectric barrier discharge

Thejaswini, H.C.; Majumdar, Abhijit; Tun, T. M.; Hippler, R.

doi:10.1016/j.asr.2011.04.020

Cited by 23 publications

(13 citation statements)

References 29 publications

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“…The C2, C3, and C4 relative concentrations can be calculated from the spectra in Figure 10: C2 is around 10 À5 , C3 around 10 À6 , and C4 slightly higher than 10 À7 . This expected trend of decreasing relative concentrations with the heavy atom number is predicted in Dobrijevic and Dutour [2006] and observed by Dobrijevic and Dutour [2006], Gautier et al [2011], andThejaswini et al [2011].…”

Section: Products Detection By Mass Spectrometrysupporting

confidence: 63%

Titan's atmosphere simulation experiment using continuum UV‐VUV synchrotron radiation

et al. 2013

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[1] A new reactor, named APSIS for Atmospheric Photochemistry Simulated by Synchrotron, is designed for simulating the reactivity occurring in planetary upper atmospheres. In this reactor, a gas mixture roughly reproducing Titan's main atmosphere composition (N 2 /CH 4 = 90/10) is irradiated by a continuous spectrum in the 60À350 nm range, provided by the DISCO beamline at the SOLEIL synchrotron radiation facility. This spectral range enables the dissociation and ionization of N 2 and CH 4 , as observed in plasma reactors and Titan's ionosphere. The neutral products are detected in situ by quadrupole mass spectrometry and collected with a cryogenic trap for ex situ analysis by gas chromatography-mass spectrometry. The detected reaction products include C2, C3, C4, and probably C5 organic compounds, with important amounts of nitrogen-bearing species: HCN, CH 3 CN, and C 2 N 2 . Neutral mass spectra obtained with APSIS are compared with Ion and Neutral Mass Spectrometer experiments of the Cassini space probe in the upper Titan atmosphere and with other results of current Titan atmosphere chemistry laboratory simulations.

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Section: Products Detection By Mass Spectrometrysupporting

confidence: 63%

Titan's atmosphere simulation experiment using continuum UV‐VUV synchrotron radiation

et al. 2013

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“…The experimental setup has been described in detail elsewhere [22,23,24,25,26]. Briefly, it consists of a plasma chamber with inner dimensions for height, length, and width of 12.3 cm, 18.0 cm, and 15.0 cm, respectively.…”

Section: Methodsmentioning

confidence: 99%

Spectroscopic Study of Plasma Polymerized a-C:H Films Deposited by a Dielectric Barrier Discharge

et al. 2016

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Plasma polymerized a-C:H thin films have been deposited on Si (100) and aluminum coated glass substrates by a dielectric barrier discharge (DBD) operated at medium pressure using C2Hm/Ar (m = 2, 4, 6) gas mixtures. The deposited films were characterized by Fourier transform infrared reflection absorption spectroscopy (FT-IRRAS), Raman spectroscopy, and ellipsometry. FT-IRRAS revealed the presence of sp3 and sp2 C–H stretching and C–H bending vibrations of bonds in the films. The presence of D and G bands was confirmed by Raman spectroscopy. Thin films obtained from C2H4/Ar and C2H6/Ar gas mixtures have ID/IG ratios of 0.45 and 0.3, respectively. The refractive indices were 2.8 and 3.1 for C2H4/Ar and C2H6/Ar films, respectively, at a photon energy of 2 eV.

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“…The plasma and chemical reactions contributing to film growth and to film composition are electron impact‐induced fragmentation of C 2 H 6 and N 2 precursor molecules into smaller molecules and radicals, for example, CH 2 , CH 3 , C 2 H 3 , C 2 H 4 , C 2 H 5 and N. The radicals are highly reactive and, already in the gas, can form larger molecules which further react in the gas phase or condense on the growing film 16. Reactions of nitrogen atoms with small hydrocarbon molecules are of particular importance,17, 18 for example and as they contribute to the formation of carbon and nitrogen‐containing molecules 18…”

Section: Atr‐ftirmentioning

confidence: 99%

Deposition of Amorphous Hydrogenated Carbon Nitride Films with a Dielectric Barrier Discharge

Martens

Thejaswini

Majumdar

et al. 2012

Plasma Processes & Polymers

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Thin amorphous carbon nitride (CNx) films have been deposited by DBD plasma. Deposition experiments have been performed on flat silicon (100) substrates using a C2H6/N2 gas mixture and deposition times of up to 6 h. The C2H6/N2 gas ratio has been varied between 1:1 and 1:5 to observe the influence of the feeding gas mixture on the chemical composition of the deposited films. The experiments were performed at gas pressures of 300 and 500 mbar. The chemical composition and bond structure of the deposited CNx films were evaluated by X‐ray photoelectron spectroscopy and by attenuated total reflectance‐Fourier transform infrared spectrometry. The results show that the chemical composition of amorphous CNx thin films depends on the working gas composition. Films deposited with higher nitrogen gas concentrations show a larger N/C ratio, an increase of C=N and C≡N bonds, and become harder.

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Plasma chemical reactions in C2H2/N2, C2H4/N2, and C2H6/N2 gas mixtures of a laboratory dielectric barrier discharge

Cited by 23 publications

References 29 publications

Titan's atmosphere simulation experiment using continuum UV‐VUV synchrotron radiation

Titan's atmosphere simulation experiment using continuum UV‐VUV synchrotron radiation

Spectroscopic Study of Plasma Polymerized a-C:H Films Deposited by a Dielectric Barrier Discharge

Deposition of Amorphous Hydrogenated Carbon Nitride Films with a Dielectric Barrier Discharge

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