Plasma-assisted pulsed laser deposition of carbon films: Effect of oxygen plasma on amorphous carbon film etching

The formation of diamond-like carbon film at atmospheric pressure by the pulsed laser/plasma hybrid deposition method

“…Since the forming mechanism of the DLC film are dominated by the kinetic energy of the carbon particles and ambient pressure of the substrate. With the increase of pressure of the plasma flow, the increase of the collision frequency with the ambient gases of the carrier flow will restrict the formation of amorphous carbon at high pressure [11,14,15].…”

“…In the other approaches similar to the PLD, the pulsed plasma deposition method has been broadly used for the formation of the DLC and other materials [6,11,12]. Due to the kinetic energy of the carbon particle in the high temperature plasma flow, the DLC film could be deposited on the substrate with the plasma [13][14][15]. It is possible to increase the kinetic energy of the carbon particles with the plasma torch at elevated temperatures of the plume under the pulsed laser radiation.…”