2004
DOI: 10.1016/s0169-4332(03)00889-4
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Plasma assisted nitridation of Ti-6Al-4V

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Cited by 106 publications
(56 citation statements)
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“…At these treatment conditions, the Ti 2 N(101) and Ti 2 N(200) planes are of lower intensity but still mostly favoured by these processing conditions, indicating that, following this treatment, the surface is mostly composed of ε-Ti 2 N. One would expect the high temperature treatment to exhibit the largest concentrations of TiN and Ti 2 N. However the 900 1C, 2 h processing conditions are compromised by the short exposure time such that nitrogen diffusion treatments at 700 1C, 48 h followed by 800 1C, 4 h exhibit the next largest peaks. Similar observations have been reported by Fouquet et al [22] for plasma nitriding processes.…”
Section: Resultssupporting
confidence: 91%
See 1 more Smart Citation
“…At these treatment conditions, the Ti 2 N(101) and Ti 2 N(200) planes are of lower intensity but still mostly favoured by these processing conditions, indicating that, following this treatment, the surface is mostly composed of ε-Ti 2 N. One would expect the high temperature treatment to exhibit the largest concentrations of TiN and Ti 2 N. However the 900 1C, 2 h processing conditions are compromised by the short exposure time such that nitrogen diffusion treatments at 700 1C, 48 h followed by 800 1C, 4 h exhibit the next largest peaks. Similar observations have been reported by Fouquet et al [22] for plasma nitriding processes.…”
Section: Resultssupporting
confidence: 91%
“…Table 3 shows that the material hardness increases with treatment temperature and duration. This is in accordance with the study carried out in [22] for a similar nitriding process. Measured hardness values depend on the compound layer characteristics, including thickness and phase composition.…”
Section: Hardness Testingsupporting
confidence: 93%
“…Plasma nitriding by glow discharge is an important process to improve surface properties of these alloys [1][2][3][4][5][6]. Some questions remain about the dependence of surface properties on nitriding parameters.…”
Section: Introductionmentioning
confidence: 99%
“…The phase ( P and S ) has a hcp structure while the phase is bcc. The nitridation of the surface has been performed at 600°C during 6 hours in a plasma-4 base ion implantation system described in previous papers [28,29]. The final microstructure is illustrated with the TEM cross-sectional micrograph in Fig.…”
Section: Materials and Experimental Proceduresmentioning
confidence: 99%
“…The compound layer is about 500 nm thick and the diffusion layer a few micrometers thick (the penetration of nitrogen depends on the crystallographic orientation of -titanium grains [29]). Note that an additional layer of amorphous Si 3 N 4 lies above the compound layer.…”
Section: Materials and Experimental Proceduresmentioning
confidence: 99%