2023
DOI: 10.1088/1361-6595/acc54c
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Plasma-assisted fluidized-bed atomic layer deposition of Pd-Cu nanoparticles on porous powder for CO2 hydrogenation

Abstract: novel plasma-assisted fluidized-bed atomic layer deposition (FB-ALD) process to synthesize Pd-Cu bimetallic nanoparticles is reported, using palladium hexafluoroacetylacetonate, copper(I)-N, N'-di-iso-propylacetamidinate, and H2 plasma. The process is able to uniformly deposit Pd-Cu nanoparticles on porous powder, which is a mixture of -Al2O3 (30 wt%), amorphous aluminum silicate (50 wt%) and molecular sieve (20 wt%) (ASM). With the metal loadings of 13.1 and 2.5 mg/g for Pd and Cu, respectively, the afforded… Show more

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Cited by 4 publications
(3 citation statements)
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“…The waveform distributions in applied voltage and current reflect, to some extent, the CO 2 reduction capabilities of the different packing systems. ,, As shown in Figure a, in the empty reactor, the peak current in the sinusoidal superposition was 21.1 mA. After the introduction of Al 2 O 3 particles, the pulsed current almost disappears while the sinusoidal current is enhanced.…”
Section: Resultsmentioning
confidence: 91%
“…The waveform distributions in applied voltage and current reflect, to some extent, the CO 2 reduction capabilities of the different packing systems. ,, As shown in Figure a, in the empty reactor, the peak current in the sinusoidal superposition was 21.1 mA. After the introduction of Al 2 O 3 particles, the pulsed current almost disappears while the sinusoidal current is enhanced.…”
Section: Resultsmentioning
confidence: 91%
“…The high‐voltage electrode was connected to a high‐voltage power supply (CTP‐2000, Nanjing Suman Plasma Technology Co., LTD) capable of delivering a bipolar sine wave output with a peak‐to‐peak voltage of 0–30 kV at an AC frequency of 20 kHz. [ 40 ] The peak‐to‐peak voltage and current applied to the DBD reactor were measured using a digital oscilloscope (Teknix, DPO4104) with a high‐voltage (Teknix, P6015A) and current probes (Teknix, 6021AC). The input power ( P in ) was calculated based on Lissajous plot.…”
Section: Methodsmentioning
confidence: 99%
“…Two common approaches developed to solve these problems are post synthesis modification of UiO-66-NH 2 (defect tailoring) and the composite of UiO-66-NH 2 with other photosensitive materials (surface chemistry) since the defect engineering and surface chemistry can tailor the properties of UiO-66-NH 2 . , Compared to traditional post synthetic methods like thermal activation/dehydration, acid/base, or high-temperature treatments, the technique of plasma modification is a time-saving, efficient, and green method to fabricate the defective MOF materials. Generally, the low-temperature plasma consists mainly of ground or excited atoms and molecules, electrons, positive and negative ions, which impact or react with the MOFs to form the missing-linker defects. Meanwhile, the low-temperature plasma treatment is able to reduce the thermal effect on MOF materials since the bulk gas temperature in the plasma remains close to room temperature.…”
Section: Introductionmentioning
confidence: 99%