1988
DOI: 10.1016/0040-6090(88)90685-2
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Plasma-assisted chemical vapour deposition of TiN and TiC on steel: Properties of coatings

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Cited by 82 publications
(22 citation statements)
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“…Once this value was reached, the coefficient of friction became constant for the remaining distance. This result was in accordance with other papers independent from the method of deposition [8,19]. When the deposition temperature increased to 470 ∘ C, coefficient of friction also increased and reached 0.2-0.3.…”
Section: Resultssupporting
confidence: 80%
See 1 more Smart Citation
“…Once this value was reached, the coefficient of friction became constant for the remaining distance. This result was in accordance with other papers independent from the method of deposition [8,19]. When the deposition temperature increased to 470 ∘ C, coefficient of friction also increased and reached 0.2-0.3.…”
Section: Resultssupporting
confidence: 80%
“…In TiC coating deposition via PACVD technique, the temperature, plasma power, duty cycle, and CH 4 and TiCl 4 flux rates are the fundamental parameters, because the amount of excess carbon is a very effective factor on the coating properties. It was shown by Stock et al, in 1998, that increasing the level of excess carbon can decrease coating hardness [4,8,9]. It is noteworthy that different researches have studied the ratio of TiCl 4 to CH 4 flux from 3 to 10 and until now there is a lack of published information on the fewer ratios.…”
Section: Introductionmentioning
confidence: 99%
“…The mechanical properties of PECVD TiN and related compounds (Ti(C,N), Ti(O,C,N), Ti-Si-N) are comparable to CVD-or PVDdeposited films (Arai, Fujita and Oguri, 1988;Sanders and Verspui, 1988;Jang, Chun and Kim, 1989;Laimer, St6ri and R6dhammer, 1990;Shizhi, Yulong and Hongrui, 1992). In general, the hardness of PECVD TiN coatings increases with increasing temperature and decreasing chlorine content (Arai, Fujita and Oguri, 1988;Sanders and Verspui, 1988).…”
Section: Silicon Nitride (Si 3 N 4 )mentioning
confidence: 85%
“…Dengan defenisi ini maka kekerasan berbanding lurus dengan modulus bulk-nya, B yang didefenisikan sebagai [2][3] Namun demikian, dalam praktek, pengukuran kekerasan ini sangat teknis sehingga menyebabkan banyak data kekerasan dari material yang sama dilaporkan secara berbeda-beda dari literatur ke literatur. Sebagai contoh, kekerasan TiN dilaporkan sangat bervariasi tergantung metode pembuatannya dari yang paling rendah 2-3 Gpa [4], sampai suatu harga yang sesuai dengan TiN stoikometri antara 20 GPa [5][6] dan 25 GPa [7]. Untuk macam-macam teknik PVD (Physical Vapour Deposition) dilaporkan suatu nilai yang tidak realistis yaitu 35 GPa untuk plasma CVD (Chemical Vapour Deposition) [8] dan 70 -80 GPa untuk teknik reactive sputtering [9][10].…”
Section: Pendahuluanunclassified