Plasma and Gas‐based Semiconductor Technologies for 2D Materials with Computational Simulation & Electronic Applications
Changmin Kim,
Muyoung Kim,
Seongho Kim
et al.
Abstract:The technique of plasma processing is beneficial for wafer cleaning and precision etching of integrated circuits and essential in manufacture of advanced semiconductor devices with unmatched perfection. Research on two‐dimensional (2D) materials, such as transition metal dichalcogenides(TMDs), offers a promising solution to the challenges in semiconductor miniaturization. TMDs, with their atomic layer thicknesses and silicon‐like bandgaps, can be integrated using existing plasma systems. Different 2D crystal s… Show more
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