1974 International Electron Devices Meeting (IEDM) 1974
DOI: 10.1109/iedm.1974.6219633
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Planar trapatt diodes

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“…2 Silicon nanocrystal process Nanocrystals for memory storage can be formed in a number of ways, including deposition/self-assembly [12], ion implantation [13], chemical reaction of multi-layers [14], and aerosol or spin-on delivery [15]. A wide range of materials can be used in the nanocrystal formation process, including semiconductors and metals [16,17], making for an active field of research. However, silicon nanocrystals represent the simplest replacement of polysilicon floating gate memory, with ready introduction into a platform CMOS flow, and are utilized in our embedded flash.…”
mentioning
confidence: 99%
“…2 Silicon nanocrystal process Nanocrystals for memory storage can be formed in a number of ways, including deposition/self-assembly [12], ion implantation [13], chemical reaction of multi-layers [14], and aerosol or spin-on delivery [15]. A wide range of materials can be used in the nanocrystal formation process, including semiconductors and metals [16,17], making for an active field of research. However, silicon nanocrystals represent the simplest replacement of polysilicon floating gate memory, with ready introduction into a platform CMOS flow, and are utilized in our embedded flash.…”
mentioning
confidence: 99%