Planar Source Line‐of‐Sight Model with Automatically Adjusting Time Increment and Local Sticking Factors

Abstract

A simple feature-scale model is developed to simulate the low pressure (LP)CVD process. The direct deposition for this model is modeled as arriving from a source plane. A line-of-sight model and cylindrical co-ordinates are used to form an analytical equation to describe the direct flux of particles arriving from the source plane. The use of a source plane allows for easier linking in multiscale simulations through the use of effective reactivity maps. A method of automatically adjusting the time increment to decrease the number of time steps required to accurately simulate the deposition process is also introduced.