“…The effect of each anion on the stability of the passive film on copper has been widely studied in different environments. 38,41,55 Furthermore, combinations of aggressive anions and inhibiting anions ͓͑SO 4 2− ͔/͓HCO 3 − ͔, 7,9,55,56 ͓Cl − ͔/͓HCO 3 − ͔, 42 and ͓SO 4 2− ͔/͓OH − ͔ 57 ͒ have also been a subject of some studies, and some critical anion ratios have been specified to minimize the pitting problems. 9,36 The mechanism is due to either the buffering capability which prevents local acidity or the formation of a possibly protective basic copper carbonate film, CuCO 3 ͑cupric carbonate͒, Cu͑OH͒ 2 ·CuCO 3 ͑mala-chite͒, Cu͑OH͒ 2 ·2CuCO 3 ͑azurite͒, or any combination of these minerals.…”