Pigmented Photoresist for Black Matrix.

Abstract

A negative resist system composed of a phenolic resin, an azide, a crosslinker and a pigment dispersion has been developed for black matrix formation of color filters (CF). The novel pigmented photoresist (PPR), which consists of poly(4-hydroxystyrene), hexamethoxymethyl melamine, 4,4'diazidostilbene-2,2'-disulfonic-N,N-diethyleneoxyethylamide and a dispersion of carbon black combines superior opacity (OD = 3. S tm 1), adequate resistance to solvents, acids and alkalis, good thermal stability, and film uniformity with excellent lithographic performance, such as high sensitivity (120 mJlcm2), high resolution (<_ 10 µm) and wide process margins. The investigation of the dissolution behavior of the film via backside exposure and the reaction ratio of the azide indicates that the pattern formation mechanism occurs mainly via insolublilization of the resist surface in the exposed areas and subsequent etching of the resist layer by the alkaline developer.

Synthesis of New Single Black Pigments Based on Azo and Anthraquinone Moieties for LCD Black Matrix

“…T d of AAQ and DAAQ was 353 and 366 C, respectively. AAQ showed T m at 267 C. Since this result has higher thermal stability than the highest temperature (250 C) reached during LCD manufacturing process, these materials can be candidate for LCD organic BM material [2,8]. An experiment is currently being conducted on the synthesis which increases the number …”

“…For full color realization of LCD, a color filter (CF) is necessary to change white back light into red (R), green (G) and blue (B) lights. In such CF a black matrix (BM) materials are between each R, G, B color pixels for high contrast [1][2][3]. BM improves the contrast of red, green and blue lights converted from white back light through prevention of external incident light.…”

“…Ideally, light should be absorbed throughout the entire visible region overall even between 400$800 nm as well as high absorption coefficient are also required. In addition, the pigment must have excellent thermal stability because it should not change by heat at the highest temperature of 250 C during the LCD manufacturing process [2,9]. Also, red, blue and green mixture method and single BM material method are available for BM.…”

P‐74: Synthesis and Characterizations of High‐Photosensitive Monomers for Black Matrix in Liquid Crystal Displays

“…Color filter in liquid crystal displays is one of key components to produce color and image [1][2][3]. The function of black matrix (BM) within color filter is to prevent light leakage and improve the contrast ratio of panel by preventing the mixing of colors among adjacent pixels [4][5]. The widely used technology for patterning BM is a photolithography.…”

Novel UV-curable and alkali-soluble resins for light-shielding black matrix application

“…5,6 To solve these problems caused by Cr, carbon black (CB) is thus adopted for preparing the BM. 7 The CB-BM is produced from a carbon black photo-resist (CB PR) which consists of CB, CB dispersant, photo-curable resin, photo-initiator (PI), and solvent.…”