2011
DOI: 10.1016/j.sna.2011.09.031
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Piezoresistivity of polycrystalline silicon applying the AIC process-route

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Cited by 10 publications
(5 citation statements)
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“…the applied strain with a GF of 10.316. The GF of polysilicon film newly developed on flexible polyimide substrate is comparable or even higher than that on traditional rigid substrate [24]- [27], demonstrating the feasibility of pressure sensing with polysilicon on a flexible substrate.…”
Section: Piezoresistivity Testmentioning
confidence: 91%
See 1 more Smart Citation
“…the applied strain with a GF of 10.316. The GF of polysilicon film newly developed on flexible polyimide substrate is comparable or even higher than that on traditional rigid substrate [24]- [27], demonstrating the feasibility of pressure sensing with polysilicon on a flexible substrate.…”
Section: Piezoresistivity Testmentioning
confidence: 91%
“…Temperatures for AIC to occur were reported as low as 165°C [23]. Uhlig et al [24] developed polysilicon film on ceramic plates using the AIC process (annealing at 330 to 660°C for up to 6h). Gauge factors (GFs) of 4.5 to 17 and temperature coefficients of resistance (TCR) between −0.4 and −0.1%/K were obtained for the developed film.…”
mentioning
confidence: 99%
“…The graph shows an increase in GF with increasing [14]. French et al [15] has reported a GF of around 40 for polysilicon films deposited using low-pressure chemical vapour deposition with processing temperature above 560°C, Uhlig et al [16] found a GF value of 24 for microcrystalline silicon obtained by AIC (annealing temperature 660°C), Patil et al [17] reported a GF of 41 for microcrystalline silicon obtained by AIC at processing temperature 400°C. Comparing our results with some high GF data for poly-Si films from the literature, we conclude that we have achieved fairly good GF values for nc-Si films at relatively low processing temperature.…”
Section: Gf ϭ ⌬R/rmentioning
confidence: 99%
“…J Weber studied thin film resonators as environmental pressure sensors and developed a model to evaluate their sensitivity [15]. Steffen developed a polycrystalline silicon thin film resonator with three-layer or two-layer structure, different film strain factors, and different resistance temperature coefficients [16]. Zhao fabricated an odorant biosensor based on ZnO film bulk acoustic resonators (FBARs) with resonant frequency of -1.5 GHz, and demonstrated the potential of FBARs as odorant biosensors [17].…”
Section: Introductionmentioning
confidence: 99%