Dots with dimensions below 100 nm are important in materials science for their original properties (luminescence, magnetism, catalysis, etc.), [1] and have been used to achieve higher data-storage densities, increased signal intensities, and higher reactivities, finding use in the computer industry, biotechnology, and catalysis. Although several techniques such as electron-and ion-beam lithography and scanning-probe methods are available today for producing nanostructures with size-dependent properties, [2][3][4] these are so expensive and time consuming that they hardly fulfill industrial requirements. Other techniques such as those based on masked surfaces [5,6] are less costly but are multistep approaches and usually limited to metallic deposition. We report a new process that combines a low-cost implementation and only a single step to produce nanodots over large areas with controlled size and density. This process is based on multilamellar vesicles, which serve as nanovectors. They incorporate metal ions such as copper ions, and under an appropriate electric field they can be directed towards an electrode. The reduction of ions on the electrode causes metal-nanodot production. Their density is controlled by the vesicle density and their size by the electric-field parameters.The manufacture of dots with sizes below 100 nm is motivated firstly by the specific properties exhibited by such nanostructures. These properties are due to surface effects and size reduction.[1] As an example, quantum dots are crystalline particles of semiconductor materials having unique optical properties. Since these are smaller in size than the wavelength of visible light, they cannot be seen under normal conditions, but become luminescent under UV light. The size of the particle controls the color of the emitted light. Also, magnetic nanostructures often exhibit interesting properties, such as when the sample size becomes comparable to that of the spin-flip diffusion length and magnetic-domain-wall width.[7]The production of small dots of controlled size usually requires very sophisticated techniques. A highly efficient technique for the deposition of monodisperse and size-controlled clusters on surfaces uses size-selected molecular beams.[8] Dots with a controlled number of atoms are then produced by laser evaporation or a sputter source. Electron-beam [2] or ion-beam lithography, [3] or nanolithography with scanning probe microscopes [4,9] such as dip-pen lithography, [10] are other examples of available techniques for deposition of dots with controlled size. However, these bottom-up techniques are so costly due to intricate fabrication processes and expensive equipment, and so time-consuming because of their step-by-step processes, that they are unsuitable as mass-production techniques.In some applications, like biosensor, biomaterial, or catalytic applications, the number of dots and the surface coverage are also of importance. Tailoring both features is essential to obtain functional structures inducing measurable signals [11]...