Physical properties and chemical states of rf sputter deposited SiWO<i>x</i> films

Electron and ion energy distribution functions and other plasma parameters such as plasma potential (V p ), electron temperature (T e ) and electron and ion number densities (n e and n i ) in low-pressure CF 4 plasmas have been measured. The experiments were conducted in a GEC cell using an inductively coupled plasma device powered by a 13.56 MHz radiofrequency (rf) power source. The measurements were made at 300 W of input rf power at 10, 30 and 50 mTorr gas pressures. Langmuir probe measurements suggest that n e , n i and V p remain constant over 60% of the central electrode area, beyond which they decrease. Within the limits of experimental error (±0.25 eV), T e remains nearly constant over the electrode area and peaks towards the electrode edge before falling rapidly. T e and V p increase with a decrease in pressure. n e and n i are not affected as significantly as T e or V p by variation in the gas pressure. The electron energy distribution function measurements indicate a highly non-Maxwellian plasma. CF + 3 is the most dominant ion product of the plasma, followed by CF + 2 and CF + . Significant amounts of etch products, SiF x /COF x (x = 0-3), of the quartz window were also detected. The concentrations of CF + 2 and CF + are much larger than that is possible from direct electron impact ionization of the parent gas. The cross-section data suggest that the direct electron impact ionization of fragment neutrals and negative ion production by electron attachment may be responsible for increase of the minor ions.

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Physical properties and chemical states of rf sputter deposited SiWOx films

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Physical properties and chemical states of rf sputter deposited SiWOx films

Abstract: Changes in refractive index and in chemical state of synchrotron radiation irradiated fluorinated polyimide films Surface chemical state populations in the molecular beam epitaxy deposition of BaF2 on GaAs by xray photoelectron spectroscopy and heavyion backscattering spectroscopy

Cited by 5 publications

References 12 publications

Solar control coatings containing a sputter deposited SiWOx film

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Langmuir probe and mass spectrometric measurements in inductively coupled CF4plasmas

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Langmuir probe and mass spectrometric measurements in inductively coupled CF₄plasmas