Physical Mechanism behind the Hysteresis-free Negative Capacitance Effect in Metal-Ferroelectric-Insulator-Metal Capacitors with Dielectric Leakage and Interfacial Trapped Charges
Chia-Sheng Hsu,
Sou-Chi Chang,
Dmitri E. Nikonov
et al.
Abstract:The negative capacitance (NC) stabilization of a ferroelectric (FE) material can potentially provide an alternative way to further reduce the power consumption in ultra-scaled devices and thus has been of great interest in technology and science in the past decade. In this article, we present a physical picture for a better understanding of the hysteresis-free charge boost effect observed experimentally in metal-ferroelectric-insulator-metal (MFIM) capacitors. By introducing the dielectric (DE) leakage and int… Show more
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