2014
DOI: 10.1038/srep06744
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Physical assembly of Ag nanocrystals on enclosed surfaces in monocrystalline Si

Abstract: Growth of thin crystals on external substrate surfaces by many different methods is a well-known technique, but its extension to inner, enclosed surfaces of large defects in monocrystalline materials has not yet been reported. The literature on thin film growth and defects in materials can be leveraged to fabricate new structures for a variety of applications. Here we show a physical process of nucleation and evolution of nanocrystalline silver inside voids in monocrystalline silicon. We found that the Ag grow… Show more

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Cited by 8 publications
(2 citation statements)
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“…2 and 4 represents the mean over all values extracted from the simulations. Initial island shapes are pyramids with a height-to-radius aspect ratio of ~1.7, bounded predominantly by (111) smooth sidewall facets, in accordance with island shapes obtained in our previous computational study 25 and experimental data on vapor-based growth of noble-metal nanostructures [35][36][37] . The island centers are aligned along the (110) direction (see Figs.…”
Section: Methodssupporting
confidence: 86%
“…2 and 4 represents the mean over all values extracted from the simulations. Initial island shapes are pyramids with a height-to-radius aspect ratio of ~1.7, bounded predominantly by (111) smooth sidewall facets, in accordance with island shapes obtained in our previous computational study 25 and experimental data on vapor-based growth of noble-metal nanostructures [35][36][37] . The island centers are aligned along the (110) direction (see Figs.…”
Section: Methodssupporting
confidence: 86%
“…dislocations as well as strong stress fields [16]. In fact, there are considerable amount of RBS/C experiments which were performed by using samples clearly containing voids [5,17,18]. However, due to the challenge of separating individual contributions of all the defects in experimental samples, it is difficult to identify the effect induced by voids alone.…”
Section: Introductionmentioning
confidence: 99%