2022 Design, Automation &Amp; Test in Europe Conference &Amp; Exhibition (DATE) 2022
DOI: 10.23919/date54114.2022.9774610
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Physical and Functional Reverse Engineering Challenges for Advanced Semiconductor Solutions

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Cited by 4 publications
(2 citation statements)
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“…An IC internal structure can be reconstructed utilizing advanced physical reverse engineering techniques [31]- [33]. Physical reverse engineering is often an invasive method divided into three steps; (1) sample preparation; (2) delayering and imaging; (3) image post-processing.…”
Section: Tests and Measurementsmentioning
confidence: 99%
See 1 more Smart Citation
“…An IC internal structure can be reconstructed utilizing advanced physical reverse engineering techniques [31]- [33]. Physical reverse engineering is often an invasive method divided into three steps; (1) sample preparation; (2) delayering and imaging; (3) image post-processing.…”
Section: Tests and Measurementsmentioning
confidence: 99%
“…Finally, the images are stitched and vectorized to retrieve the layout representation of the chip [32]. Note this process is yet to be fully automated, resulting in a highly time-intensive task prone to errors [31]. On the other hand, promising methods are utilizing x-ray diffraction or a confocal microscope to recover the inner structure of the IC without the need for delayering [33], i.e., without destroying the inspected sample.…”
Section: Tests and Measurementsmentioning
confidence: 99%