2017
DOI: 10.1016/j.solmat.2017.07.029
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Photovoltaic characterisation of GaAsBi/GaAs multiple quantum well devices

Abstract: A series of strained GaAsBi/GaAs multiple quantum well diodes are characterised to assess the potential of GaAsBi for photovoltaic applications. The devices are compared with strained and strain-balanced InGaAs based devices. The dark currents of the GaAsBi based devices are around 20 times higher than those of the InGaAs based devices. The GaAsBi devices that have undergone significant strain relaxation have dark currents that are a further 10–20 times higher. Quantum efficiency measurements show the GaAsBi d… Show more

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Cited by 43 publications
(33 citation statements)
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“…1,2 However, due to the large mismatch in atomic size and electronegativity between arsenic (As) and Bi, the bulk solubility limit of Bi in GaAs is extremely low (x < 5.2 9 10 À5 ), 3 requiring nonequilibrium growth techniques to access these unique bandgap/lattice constant combinations. Techniques such as molecular beam epitaxy (MBE) and metalorganic vaporphase epitaxy (MOVPE) are well suited for this purpose and have led to bismide devices with x = 0.02 to 0.074 Bi fraction, as demonstrated in photodiodes [4][5][6] and near-infrared (IR) lasers. 7 Additionally, there is great interest in incorporating higher-bismuth-fraction (x > 0.10) materials into devices to reduce Auger recombination in mid-IR lasers 8 and increase diode efficiency in thermophotovoltaic power systems.…”
Section: Introductionmentioning
confidence: 99%
“…1,2 However, due to the large mismatch in atomic size and electronegativity between arsenic (As) and Bi, the bulk solubility limit of Bi in GaAs is extremely low (x < 5.2 9 10 À5 ), 3 requiring nonequilibrium growth techniques to access these unique bandgap/lattice constant combinations. Techniques such as molecular beam epitaxy (MBE) and metalorganic vaporphase epitaxy (MOVPE) are well suited for this purpose and have led to bismide devices with x = 0.02 to 0.074 Bi fraction, as demonstrated in photodiodes [4][5][6] and near-infrared (IR) lasers. 7 Additionally, there is great interest in incorporating higher-bismuth-fraction (x > 0.10) materials into devices to reduce Auger recombination in mid-IR lasers 8 and increase diode efficiency in thermophotovoltaic power systems.…”
Section: Introductionmentioning
confidence: 99%
“…The incorporation of dilute quatities of bismuth into GaAs has been highlighted as a promising material system for a range of optoelectronic device applications, including telecommunications band (1550–1300 nm) lasers 1–3 , mid-IR photosensitive detectors 47 and multi-junction photovoltaics (PV) 8–10 . The application of dilute bismide alloys to multi-junction PV could offer a suitable pathway to realising a highly desirable 1.0 eV band-gap sub-cell, which is crucial for the development of future four junction solar cells.…”
Section: Introductionmentioning
confidence: 99%
“…This may allow suppressing the inter-valence band absorption and Auger-Meitner recombination in GaAs 1−x Bi x with concentrations x > 10% [4]. Combined with the reduced band gap sensitivity, these properties make the bismide an attractive candidate for applications in the long-wave infrared lasers, photodetectors, and multijunction solar cells, among others [1,[5][6][7].…”
Section: Introductionmentioning
confidence: 99%