Abstract:Multiple-band and spectrally distinctive photodetection play critical roles in building next-generation colorful imaging, spectroscopy, artificial vision, and optically controlled logic circuits of the future. Unfortunately, it remains challenging for conventional semiconductor photodetectors to distinguish different spectrum bands with photon energy above the bandgap of the material. Herein, for the first time, a photocurrent polarity-switchable photoelectrochemical device composed of group III-nitride semico… Show more
“… Photodetector Type Working mechanism Wavelength [nm] Photocurrent magnitude Responsivity [mA W −1 ] Ref. a-MoS x @p-AlGaN/n-GaN PEC PD p-n junction/PEC effect 254 μA cm −2 −100.42 This work 365 μA cm −2 29.5 Pt/p-AlGaN/n-GaN PEC PD p-n junction/PEC effect 254 μA cm −2 −175 41 365 μA cm −2 31 AlGaN/Pt-GaN cell PEC PD Photovoltage-competing/PEC effect 254 μA cm −2 11.39 42 365 μA cm −2 −0.3 Pt/p-GaN PEC PD Carrier transport/PEC effect 285 μA cm −2 −7.2 43 365 μA cm −2 1.1 α-Ga 2 O 3 /Cu 2 O PEC PD p-n junction/PEC effect 254 μA 0.42 44 365 μA −0.57 Au/TiO 2 PEC PD Plasmon/PEC effect 400 nA −0.6 36 800 nA 0.15 p-SnS/p-Si Solid-state PD Photovoltage 400 μA ...…”
Section: Resultsmentioning
confidence: 96%
“…Essentially, the pursuit of polarity-switchable photoconductivity behavior has recently attracted considerable interests [35][36][37] , because the polarity-switchable photocurrent can be employed to distinguish spectrum bands while measuring corresponding light intensity, which has been realized in many solid-state devices [37][38][39][40] . The proposed III-nitride/a-MoS x core-shell nanostructures demonstrate a polarityswitchable photoconductivity under different-energy photon illumination, i.e., it exhibits a polarity-switchable photoresponse with a responsivity of −100.42 mA W −1 under 254 nm illumination, and 29.5 mA W −1 under 365 nm illumination, one of the highest value among reported polarity-switchable devices 36,[38][39][40][41][42][43][44][45][46][47][48][49][50] . Moreover, the underlying mechanism of polarity-switchable photoconductivity behavior is revealed via density functional theory (DFT) calculations.…”
III–V semiconductor nanowires are indispensable building blocks for nanoscale electronic and optoelectronic devices. However, solely relying on their intrinsic physical and material properties sometimes limits device functionalities to meet the increasing demands in versatile and complex electronic world. By leveraging the distinctive nature of the one-dimensional geometry and large surface-to-volume ratio of the nanowires, new properties can be attained through monolithic integration of conventional nanowires with other easy-synthesized functional materials. Herein, we combine high-crystal-quality III-nitride nanowires with amorphous molybdenum sulfides (a-MoSx) to construct III-nitride/a-MoSx core-shell nanostructures. Upon light illumination, such nanostructures exhibit striking spectrally distinctive photodetection characteristic in photoelectrochemical environment, demonstrating a negative photoresponsivity of −100.42 mA W−1 under 254 nm illumination, and a positive photoresponsivity of 29.5 mA W−1 under 365 nm illumination. Density functional theory calculations reveal that the successful surface modification of the nanowires via a-MoSx decoration accelerates the reaction process at the electrolyte/nanowire interface, leading to the generation of opposite photocurrent signals under different photon illumination. Most importantly, such polarity-switchable photoconductivity can be further tuned for multiple wavelength bands photodetection by simply adjusting the surrounding environment and/or tailoring the nanowire composition, showing great promise to build light-wavelength controllable sensing devices in the future.
“… Photodetector Type Working mechanism Wavelength [nm] Photocurrent magnitude Responsivity [mA W −1 ] Ref. a-MoS x @p-AlGaN/n-GaN PEC PD p-n junction/PEC effect 254 μA cm −2 −100.42 This work 365 μA cm −2 29.5 Pt/p-AlGaN/n-GaN PEC PD p-n junction/PEC effect 254 μA cm −2 −175 41 365 μA cm −2 31 AlGaN/Pt-GaN cell PEC PD Photovoltage-competing/PEC effect 254 μA cm −2 11.39 42 365 μA cm −2 −0.3 Pt/p-GaN PEC PD Carrier transport/PEC effect 285 μA cm −2 −7.2 43 365 μA cm −2 1.1 α-Ga 2 O 3 /Cu 2 O PEC PD p-n junction/PEC effect 254 μA 0.42 44 365 μA −0.57 Au/TiO 2 PEC PD Plasmon/PEC effect 400 nA −0.6 36 800 nA 0.15 p-SnS/p-Si Solid-state PD Photovoltage 400 μA ...…”
Section: Resultsmentioning
confidence: 96%
“…Essentially, the pursuit of polarity-switchable photoconductivity behavior has recently attracted considerable interests [35][36][37] , because the polarity-switchable photocurrent can be employed to distinguish spectrum bands while measuring corresponding light intensity, which has been realized in many solid-state devices [37][38][39][40] . The proposed III-nitride/a-MoS x core-shell nanostructures demonstrate a polarityswitchable photoconductivity under different-energy photon illumination, i.e., it exhibits a polarity-switchable photoresponse with a responsivity of −100.42 mA W −1 under 254 nm illumination, and 29.5 mA W −1 under 365 nm illumination, one of the highest value among reported polarity-switchable devices 36,[38][39][40][41][42][43][44][45][46][47][48][49][50] . Moreover, the underlying mechanism of polarity-switchable photoconductivity behavior is revealed via density functional theory (DFT) calculations.…”
III–V semiconductor nanowires are indispensable building blocks for nanoscale electronic and optoelectronic devices. However, solely relying on their intrinsic physical and material properties sometimes limits device functionalities to meet the increasing demands in versatile and complex electronic world. By leveraging the distinctive nature of the one-dimensional geometry and large surface-to-volume ratio of the nanowires, new properties can be attained through monolithic integration of conventional nanowires with other easy-synthesized functional materials. Herein, we combine high-crystal-quality III-nitride nanowires with amorphous molybdenum sulfides (a-MoSx) to construct III-nitride/a-MoSx core-shell nanostructures. Upon light illumination, such nanostructures exhibit striking spectrally distinctive photodetection characteristic in photoelectrochemical environment, demonstrating a negative photoresponsivity of −100.42 mA W−1 under 254 nm illumination, and a positive photoresponsivity of 29.5 mA W−1 under 365 nm illumination. Density functional theory calculations reveal that the successful surface modification of the nanowires via a-MoSx decoration accelerates the reaction process at the electrolyte/nanowire interface, leading to the generation of opposite photocurrent signals under different photon illumination. Most importantly, such polarity-switchable photoconductivity can be further tuned for multiple wavelength bands photodetection by simply adjusting the surrounding environment and/or tailoring the nanowire composition, showing great promise to build light-wavelength controllable sensing devices in the future.
“…A tunable wide energy bandgap enables the intrinsic wavelength of AlGaN to cover a large range of UVA to DUV (200–365 nm), thus rendering AlGaN crucial to UV detection and luminescence fields. In addition, the AlGaN heterostructure plays a significant role in transistors as well as photodetectors due to its non-negligible polarization effects. − Accordingly, the development of AlGaN materials and devices could effectively promote the progress of semiconductor techniques. − …”
As a burgeoning wide-band gap semiconductor material,
Al
x
Ga1–x
N alloy has
attracted great attention for versatile applications due to its superior
properties. However, its poor crystalline quality has restricted the
employment of AlGaN on electronic devices for a long time. Herein,
we proposed a nanopillar/superlattice hierarchical structure for AlGaN
epitaxy to boost the crystalline quality. The scale-controllable AlN
nanopillar template is fabricated from a nickel self-assembly process.
AlGaN initiates the epitaxial laterally overgrowth mode based on the
nanopatterned template. In addition, the Al
x
Ga1–x
N/Al
y
Ga1–y
N superlattice structure
could effectively block the propagation of threading dislocation segments.
The kinetics of the dislocation and epitaxy process in the hierarchical
structure is intuitively demonstrated and analyzed. Consequently,
the dislocation density of AlGaN grown by this method is significantly
reduced by more than 30 times compared to the AlN template. No threading
dislocation segments were observed in the 4 μm TEM field of
view. Moreover, based on the hierarchical structure, we also fabricated
an AlGaN ultraviolet avalanche photodiode (APD). The APD exhibits
superior performance, achieving a maximum gain of 1.3 × 105 and high responsivity of 1.46 A/W at 324 nm. The reliability
of the nanopillar/superlattice AlGaN epitaxial procedure is anticipated
to shed new light on the nitride semiconductor material, further bringing
a breakthrough to wide-band gap electronic devices.
“…In addition, compared with conventional solid-state photodetectors (e.g., photoconductive-type, Schottky-type, and so forth), the emerging photoelectrochemical type operates with a combination of physical and electrolyte-assisted chemical processes which offers more flexibility and tunability in detecting the incident light signals. 17 In this work, we demonstrated a highly deep UV-sensitive broadband photodetector based on the plasmonic Pt nanoparticles (NPs) combined with the p-type AlGaN nanostructures, which operates in a photoelectrochemical mode. Benefiting from the hot charge injection and near-field electromagnetic amplification induced by LSPR, the Ptdecorated photodetectors maintained a high UV sensitivity and exhibited a significant boost of UV photoresponsivity, that is, 7-fold under 254 nm illumination and 64-fold under 365 illumination as compared to those devices composed of pristine nanostructures.…”
mentioning
confidence: 99%
“…To realize near UV or even solar-blind photodetection with high responsivity, wide band gap semiconductors such as group III-nitrides or III-oxides are frequently chosen, whereas these materials are generally used to construct the UV-specific photodetectors with narrow response spectra, which may limit their photodetecting application in the broadband range. , To overcome those fundamental limits, the plasmonic metals combined with the UV-responsive semiconductor may be an alternative approach to construct a UV-sensitive broadband photodetector, which can satisfy the requirements of UV–visible broadband light communication, spectral analysis, environment monitoring, and spectroscopic applications. , Bearing these in mind, we are aiming to construct such a device that can maintain a high UV-responsive performance while broadening its detection range. In addition, compared with conventional solid-state photodetectors (e.g., photoconductive-type, Schottky-type, and so forth), the emerging photoelectrochemical type operates with a combination of physical and electrolyte-assisted chemical processes which offers more flexibility and tunability in detecting the incident light signals …”
Coupling the plasmonic metals with semiconductors often induces strong charge and energy transfer across heterointerfaces, offering an unprecedented opportunity to break the fundamental limit of semiconductor optoelectronic devices. Herein, we demonstrate a broadened photodetection bandwidth with drastically enhanced photoresponsivity of photoelectrochemical cells by coupling the plasmonic−platinum nanoparticles with p-type AlGaN-semiconductor nanostructures. Benefiting from the localized surface plasmon resonance at the platinum-AlGaN nanostructure interface, our devices exhibit a striking 3 orders of magnitude boost of the photoresponsivity in the visible band, which is barely attainable in pristine wide band gap semiconductors. Simultaneously, a nearly sevenfold enhancement of the photoresponsivity can also be achieved under 254 nm light illumination, demonstrating high-responsive deep ultraviolet-sensitive broad-bandwidth photodetection. Most importantly, the proposed plasmon-induced metal/semiconductor hybrid nanoarchitectures, by embracing a diversity of plasmonic metals combined with the wide tunable band gap of the group III-nitride semiconductors via synergy of the plasmonic−photoelectric effect, show significant promise in designing specific wavelength-dominance broadband photosensing systems of the future.
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