Photosensitivity Characteristics of UV Curable Organic-Inorganic Hybrids Sensitized with Benzoin Derivatives as Photobase Generators

Ishikawa, Nobuhiro; Arimitsu, Koji; Furutani, Masahiro; Gunji, Takahiro; Abe, Yoshimoto

doi:10.2494/photopolymer.27.223

Cited by 3 publications

(2 citation statements)

References 15 publications

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“…The solid residue was filtered and washed with water to obtain intermediate compound (4). Compounds 5 and PBG1 were synthesized according to the previous reports [8,9].…”

Section: Synthesis (Scheme 2)mentioning

confidence: 99%

“…Photodecomposition of benzoin with high quantum yield ( has been reported [7]. Furthermore, it is expected that photolysis of the benzoin structure would generate bases and/or radicals by UV irradiation [8][9][10][11][12][13][14][15][16][17]. However, conventional PBG based on a benzoin structure has a narrow absorption wavelength range, leading to the restriction of its application.…”

Section: Introductionmentioning

confidence: 99%

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Development of Photobase Generators Liberating Radicals as well as Bases and Their Application to Hardcoating Materials

Terada

Furutani

Arimitsu

2018

J. Photopol. Sci. Technol.

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Most of the photosensitive materials are based on photoradical and/or photocationic polymerization, because many photoradical and photoacid generators, monomers, and oligomers are commercially available. Although photosensitive materials based on basecatalyzed reactions have merit in preventing erosion of metallic substrates, Photobase generators (PBGs) generally have lower quantum yields when compared to photoradical initiators (PIs) and photoacid generators (PAGs). We report here novel PBGs based on a benzoin structure. This PBG can liberate radicals as well as bases with high efficiency by iline irradiation, so that a homogeneous organic-inorganic hybrid film can be formed. As a result, the hardcoating materials based on the organic-inorganic hybrid show high pencilhardness (4H), transparency, and scratch resistance compared to coating materials using conventional PIs and PBGs.

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“…The solid residue was filtered and washed with water to obtain intermediate compound (4). Compounds 5 and PBG1 were synthesized according to the previous reports [8,9].…”

Section: Synthesis (Scheme 2)mentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Development of Photobase Generators Liberating Radicals as well as Bases and Their Application to Hardcoating Materials

Terada

Furutani

Arimitsu

2018

J. Photopol. Sci. Technol.

Self Cite

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Anionic UV curing of epoxy resins containing dispersed scaly silica modified with base-amplifying groups

Arimitsu

Sugioka

Watanabe

et al. 2017

Progress in Organic Coatings

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Photobase Generators Liberating Two Bases by Absorbing One Photon and Their Application to Photosensitive Materials

2015

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We propose a photobase generator (PBG) that liberates two bases by absorbing one photon. Phototriggered decarboxylation proceeds first to generate one base, and subsequently the unstable reaction intermediate is thermally decarboxylated to generate another base. It was found that the photosensitivity of poly(glycidyl methacrylate) films containing the PBG is much higher than that of films containing a conventional PBG that generates one base by absorbing one photon.

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Photosensitivity Characteristics of UV Curable Organic-Inorganic Hybrids Sensitized with Benzoin Derivatives as Photobase Generators

Cited by 3 publications

References 15 publications

Development of Photobase Generators Liberating Radicals as well as Bases and Their Application to Hardcoating Materials

Development of Photobase Generators Liberating Radicals as well as Bases and Their Application to Hardcoating Materials

Anionic UV curing of epoxy resins containing dispersed scaly silica modified with base-amplifying groups

Photobase Generators Liberating Two Bases by Absorbing One Photon and Their Application to Photosensitive Materials

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