A review of recent work utilizing photosensitive protecting groups is presented, (literature to September 1973 is reviewed). Although still in the developmental stage, the application of groups such as 2‐nitrobenzyl, 3‐nitrophenyl, 3,5‐dimethoxybenzyl, 2,4‐dinitrobenzenesulfenyl and 3,5‐dimethoxybenzoinyl in synthetic chemistry shows great promise for the future.