Photoresists for microlithography

Roy, Debmalya; Pk, Basu; Eswaran, S. V.

doi:10.1007/bf02836753

Cited by 12 publications

(11 citation statements)

References 5 publications

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“…Positive and negative photoresists are the two major classes of photoresists available commercially. 4,5 Currently, the former dominate the world market and have mostly displaced the negative ones. However, the latter are still useful in micro electro mechanical systems.…”

Section: Introductionmentioning

confidence: 99%

Cashew nut shell liquid based t‐BOC protected alternating “high ortho” copolymer as a possible e‐beam resist: Characterization using multi‐dimensional NMR spectroscopy

Sharma¹,

Raghunathan²,

Eswaran³

2008

J of Applied Polymer Sci

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A cardanol/m-cresol-based copolymer was esterified using di-tert-butyl dicarbonate (t-BOC), which makes it a suitable candidate as a possible e-beam resists. This work reports a full characterization of the product using the techniques of FTIR and UV-Visible spectroscopy, one dimensional 1 H NMR, 13 C NMR, DEPT-135. Two dimensional NMR experiments such as, COSY, HSQC, and HMBC have been employed for exhaustive probing of the microstructural details of this derivatized copolymer.

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Section: Introductionmentioning

confidence: 99%

Cashew nut shell liquid based t‐BOC protected alternating “high ortho” copolymer as a possible e‐beam resist: Characterization using multi‐dimensional NMR spectroscopy

Sharma¹,

Raghunathan²,

Eswaran³

2008

J of Applied Polymer Sci

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“…In positive photoresists the exposed parts of photoresists become soluble in the developer. 4,6,7 In case of positive resists, on photolysis often an acidic group is generated and the basic developer easily washes this out. On the other hand, in negative photoresists, on exposure to light cross-linking makes the exposed parts more insoluble in the developer, usually an organic solvent.…”

Section: Introductionmentioning

confidence: 99%

Azido-m-meconine-‘high ortho’ Novolak resin-based negative photoresists for deep UV lithography

et al. 2009

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Photoactive chemicals blended with polymers, solvents and certain other additives serve as photoresists. A new photoactive compound (PAC), azido-m-meconine absorbing in the deep UV region has been blended with 'alternating' and 'semi-alternating' and 'high ortho' alternating novolak resins, based on m/p-cresol. The new photoresists have been evaluated as a negative tone deep UV photoresist for mircolithography.

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“…Positive and negative photoresists are the two major classes of photoresists available commercially. 1,2 The former currently dominate the world market and have mostly displaced the negative ones. However, the latter are, still useful in micro electro-mechanical systems (MEMS).…”

Section: Introductionmentioning

confidence: 99%

m/p‐Cresol–based t‐BOC protected alternating “high ortho” copolymer as a possible e‐beam resist: Characterization using multidimensional NMR spectroscopy

Sharma

Hopson

Raghunathan³

et al. 2009

J of Applied Polymer Sci

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Synthesis of a m/p-cresol-based novolac resin and its subsequent esterification using di-tert-butyl dicarbonate (t-BOC) is described. The product has been characterized using techniques of FTIR spectroscopy, one dimensional 1 H NMR, 13 C NMR, and DEPT-135 spectra. Two dimensional NMR experiments like, COSY, HSQC, and HMBC have been used for exhaustive probing of the microstructural details of the derivatized copolymer.

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Photoresists for microlithography

Cited by 12 publications

References 5 publications

Cashew nut shell liquid based t‐BOC protected alternating “high ortho” copolymer as a possible e‐beam resist: Characterization using multi‐dimensional NMR spectroscopy

Cashew nut shell liquid based t‐BOC protected alternating “high ortho” copolymer as a possible e‐beam resist: Characterization using multi‐dimensional NMR spectroscopy

Azido-m-meconine-‘high ortho’ Novolak resin-based negative photoresists for deep UV lithography

m/p‐Cresol–based t‐BOC protected alternating “high ortho” copolymer as a possible e‐beam resist: Characterization using multidimensional NMR spectroscopy

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