Photoresist Templates for Wafer‐Scale Defect‐Free Evaporative Lithography

Abstract

A highly efficient evaporative lithography method for wafer‐scale patterning of microwire networks is introduced. The method is based on the use of a photolithography defined photoresist as the template for the evaporative self‐assembly of nanoparticles contained in liquid suspensions. An example application is given showing the patterning of conducting‐transparent microwire coating composed of gold nanoparticles that outperform standard ITO coatings.

Controlling the Localization of Liquid Droplets in Polymer Matrices by Evaporative Lithography

“…[5] Fundamental to these functions is the liquid storage within the solid matrix. [7] Herein, we describe am ethod to use evaporative lithography to control the localized incorporation of liquid droplets into dynamic polymer matrices.Evaporative lithography is anovel technique to control particle migration during the drying of al iquid phase.I ti sb ased on the mediation of solvent evaporation with masks, [8] and inspired by the coffee ring phenomenon, which refers to the drying of as uspension droplet, in which heterogeneous evaporation rates cause an internal flow and result in the localized deposition of particles. [6] These processes challenge the direct localization of liquid inclusions in as olid matrix produced from ahomogeneous solution and then make precise/targeted delivery,f ine mediation of the surface properties,a nd the control of water movement on the surface difficult.…”

“…[6] These processes challenge the direct localization of liquid inclusions in as olid matrix produced from ahomogeneous solution and then make precise/targeted delivery,f ine mediation of the surface properties,a nd the control of water movement on the surface difficult. [7] Herein, we describe am ethod to use evaporative lithography to control the localized incorporation of liquid droplets into dynamic polymer matrices.Evaporative lithography is anovel technique to control particle migration during the drying of al iquid phase.I ti sb ased on the mediation of solvent evaporation with masks, [8] and inspired by the coffee ring phenomenon, which refers to the drying of as uspension droplet, in which heterogeneous evaporation rates cause an internal flow and result in the localized deposition of particles. [9] To create polymer matrices with embedded liquid droplets by evaporative lithography,t he starting system should contain three components:ap olymer able to form ac rosslinked matrix after solvent evaporation, an onvolatile liquid to be encapsulated, and av olatile solvent that can dissolve both the polymer precursor and the liquid.…”

Hierarchical Assembly of Plasmonic Nanoparticles*

“…[37] C) Gold wires obtained by evaporative lithography using ap hotoresist as am old. [38] D) 3D nanoparticle supercrystals obtained using microevaporation in microfluidic channels. [39] E) Gold nanorod 3D supercrystals obtained using aP DMS mold displaying arrays of micro-cavities.…”

“…In order to improvet he reproducibility and versatility,t he authors used ap hotoresist as am askt od irect the drying of the goldc olloid ( Figure 4C). [38] An alternative method is screen printing, so that the resulting structures could be tuned via the screen mesh. [46] Similarly,M archi-Artzner and co-workers used aP DMS mold to control meniscus morphologies at the gaps between cylindrical posts, which were engineered by soft lithography allowing great versatility on features morphologya nd spacing.…”

Printable Functional Chips Based on Nanoparticle Assembly

“…They also developed an approach of well-controlled rectangular, honeycomb and hexagonal topologies microwire by using templates with pillar-roof arch structures. [120] This method achieving various patterns based on liquid bridges has led to significant development of functional networks with various assembly materials. Here, we focus on the impact of wettability of patterned substrates on various liquid bridges formation during the evaporation process and the resulting NPs assembly.…”