A model of Ge incorporation into CdTe lattice based on the analysis of temperature influence of post‐growth crystal annealing on CdTe:Ge electric properties is proposed. Ge impurity is mainly placed in Te sublattice in crystals fast cooled from high temperatures. GeTe defect is an acceptor defining the electric and photoelectric properties at T ≤ 290 K. GeCd donors and deep (GeCdVCd)/ acceptors are generated in lesser amount. Long‐term ingot thermal treatment at T < 1090 K causes germanium atom relocalization chiefly into cadmium sublattice. (© 2006 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)