2005
DOI: 10.1016/j.jcrysgro.2004.12.071
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Photoreflectance investigations of HEMT structures grown by MBE

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Cited by 6 publications
(6 citation statements)
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“…On the other hand, photoreflectance spectroscopy (PR) is a technique that has been widely used for the study and characterization of semiconductor devices structures [5][6][7][8][9]. Some reports have been focused to determine the origin of Franz-Keldysh oscillations (FKO) that are usually observed in the PR spectra.…”
Section: Introductionmentioning
confidence: 99%
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“…On the other hand, photoreflectance spectroscopy (PR) is a technique that has been widely used for the study and characterization of semiconductor devices structures [5][6][7][8][9]. Some reports have been focused to determine the origin of Franz-Keldysh oscillations (FKO) that are usually observed in the PR spectra.…”
Section: Introductionmentioning
confidence: 99%
“…Some reports have been focused to determine the origin of Franz-Keldysh oscillations (FKO) that are usually observed in the PR spectra. Now we know that wide-period FKO above energy gap of GaAs are associated to surface electric fields and short-period FKO are originated by the internal AlGaAs/GaAs interface [8][9][10].…”
Section: Introductionmentioning
confidence: 99%
“…All PR spectra have very similar line shape despite that the samples have different thickness layers. In previous works, BP-FKO has been associated to the surface electric field [9][10][11]. By FKO analysis similar to those described elsewhere [12] we calculated the electric field strength (F S ), which range from 2.27 to 2.57 x 10 7 V/m (see table 2).…”
Section: Resultsmentioning
confidence: 98%
“…Optical approaches like photoreflectance and photoluminescence spectroscopy are very useful techniques that have been widely used for the study and characterization of AlGaAs/GaAs system [5][6][7][8][9][10][11]. Some reports have been focused to determinate the origin of FranzKeldyshoscillations (FKO) that usually are observed at the PR spectra, now we know that wideperiod FKO are associated to surface electric field and short-period FKO are originated by 299 A58 internal AlGaAs/GaAs interfaces [9][10][11].…”
Section: Introductionmentioning
confidence: 99%
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