2011
DOI: 10.5012/bkcs.2011.32.8.3155
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Photoreactions of (2-Acetoxyphenyl)pentamethyldisilane

Abstract: It is well known that the photoreactions of aryldisilanes show four reaction patterns 1 since the first report on the photolysis of phenylpentamethyldisilane and (p-tolyl)pentamethyldisilane by Ishikawa et al.2 in 1975 : (path a) formation of a silene compound via elimination of a trimethylsilane 3 , (path b) formation of a silene compound arising from 1,3-shift of trimethylsilyl radical, which is formed via homolytic cleavage of silicon-silicon bond [4][5][6][7][8][9] , (path c) formation of a trimethylsilyl … Show more

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“…The photochemistry of compound 6 can be in part explained by the typical behavior of disubstituted phenyl pentamethyldisilane upon excitation in polar solvents. In fact, when the aromatic ring of the disilane is substituted with a more photolabile moiety, as the OCOMe group in (2-acetoxyphenyl)pentamethyldisilane, the disilane structure remains untouched after the reaction [88]. However, other substituted phenyldisilanes showed a varied photoreactivity including the formation of a silylene intermediate or the nucleophilic attack of a protic solvent (e.g., an alcohol) at the β-silicon atom or the photohomolytic cleavage of the Si-Si bond [89][90][91][92][93].…”
Section: Discussionmentioning
confidence: 99%
“…The photochemistry of compound 6 can be in part explained by the typical behavior of disubstituted phenyl pentamethyldisilane upon excitation in polar solvents. In fact, when the aromatic ring of the disilane is substituted with a more photolabile moiety, as the OCOMe group in (2-acetoxyphenyl)pentamethyldisilane, the disilane structure remains untouched after the reaction [88]. However, other substituted phenyldisilanes showed a varied photoreactivity including the formation of a silylene intermediate or the nucleophilic attack of a protic solvent (e.g., an alcohol) at the β-silicon atom or the photohomolytic cleavage of the Si-Si bond [89][90][91][92][93].…”
Section: Discussionmentioning
confidence: 99%