1971
DOI: 10.1002/pol.1971.150090723
|View full text |Cite
|
Sign up to set email alerts
|

Photopolymerization of tetrafluoroethylene to a fusible polymer

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1

Citation Types

0
1
0

Year Published

1971
1971
2002
2002

Publication Types

Select...
5

Relationship

1
4

Authors

Journals

citations
Cited by 5 publications
(1 citation statement)
references
References 15 publications
0
1
0
Order By: Relevance
“…The surface-photopolymerization process at low wavelengths from monomers such as C4H, (62,63), C4Cl, (63), and CzF4 (63) has recently been shown to yield polymeric thin-films of high temperature stability from monomers such as N-phenylmaleimide (64). The direct photolysis of C2F4 at pressures above 10 torr and at wavelengths less than 240019 yields a white particulate powder that fuses at temperatures -330°C to a clear deposit (65). The process then involves photopolymerization in the gas phase.…”
Section: Recent Photochemical Processesmentioning
confidence: 99%
“…The surface-photopolymerization process at low wavelengths from monomers such as C4H, (62,63), C4Cl, (63), and CzF4 (63) has recently been shown to yield polymeric thin-films of high temperature stability from monomers such as N-phenylmaleimide (64). The direct photolysis of C2F4 at pressures above 10 torr and at wavelengths less than 240019 yields a white particulate powder that fuses at temperatures -330°C to a clear deposit (65). The process then involves photopolymerization in the gas phase.…”
Section: Recent Photochemical Processesmentioning
confidence: 99%