Holography: Advances and Modern Trends II 2011 Help me understand this report
Photopolymerizable thiol-ene nanocomposite materials for holographic applications
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“…Регистрирующие фотополимеризующиеся материалы с низкой усадкой слоя (0.5%) были получены на ос-нове тиольных мономеров и наночастиц SiO 2 [75]. Фо-тоиндуцированное изменение показателя преломления составляло n = 1 · 10 −2 при экспозиции 15 mJ/cm 2 [76].…”
Section: O O Ohunclassified
“…Регистрирующие фотополимеризующиеся материалы с низкой усадкой слоя (0.5%) были получены на ос-нове тиольных мономеров и наночастиц SiO 2 [75]. Фо-тоиндуцированное изменение показателя преломления составляло n = 1 · 10 −2 при э кспозиции 15 mJ/cm 2 [76].…”
Section: O O Ohunclassified
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