2010
DOI: 10.1021/jp106672f
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Photopatterning of PMMA Films with Gold Nanoparticles: Diffusion of AuCl4 Ions

Abstract: Photopatterning of poly(methyl methacrylate) (PMMA) films is performed by UV irradiation of the polymer films containing uniformly distributed AuCl 4 -ions. The process reduces the gold ions and leads to production of Au nanoparticles in the irradiated regions at room temperature (RT). Resulting films are investigated with scanning electron microscopy, which revealed, in addition to regions with gold nanoparticles, the presence of "ion-depleted regions". These regions are formed at RT and within the rigid poly… Show more

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Cited by 15 publications
(13 citation statements)
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References 22 publications
(35 reference statements)
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“…From the fabrication point of view, it is likely that the localization of gold occurs during the irradiation process. As the gold ions experience the light intensity gradient of the interference pattern, they migrate toward the bright fringes and are photo-reduced near the surface of the films [43]. This would explain why the localization is more pronounced in the case of GNGs than for HFs, for which the irradiation is homogenous (no gradient).…”
Section: Resultsmentioning
confidence: 99%
“…From the fabrication point of view, it is likely that the localization of gold occurs during the irradiation process. As the gold ions experience the light intensity gradient of the interference pattern, they migrate toward the bright fringes and are photo-reduced near the surface of the films [43]. This would explain why the localization is more pronounced in the case of GNGs than for HFs, for which the irradiation is homogenous (no gradient).…”
Section: Resultsmentioning
confidence: 99%
“…5(b). In addition, some ion diffusion may also occur, leading to a homogenization of the ionic concentration 28 . Finally, the gold atom distribution becomes almost uniform as all gold ions are reduced and the diffraction goes to a minimum after 40 min of irradiation.…”
Section: Resultsmentioning
confidence: 99%
“…특히 전자공학의 발전에 따 라 보다 작으면서도 더욱 높은 집적도를 지닌 전자소자, 우 수한 표시성능을 가진 디스플레이 등이 요구되고 있으며, 이 를 위해 나노 복합재료에 추가적으로 포토패터닝 성능을 부 여하는 시도가 활발이 진행되고 있다. [11][12][13][14][15] Marques-Hueso 그 룹에서는 전통적인 포지티브 감광재료인 2-diazo-2H-naphthalen-1-one(DNQ)-novolac에 금 입자 혹은 은 나노입자를 첨가한 후 마이크로 포토패터닝을 진행하여 나노입자 크기에 따른 광학적 특성 변화에 대해 확인하였으며, 특정 화학물질에 대 한 센서로 기능을 확인하였다. 11 Jiguet 그룹에서는 네거티브 감광재료인 SU-8을 적용, 실리카 입자가 분산된 에폭시 고분 자-나노입자 복합재료의 패턴 형성을 진행하여 부착성 및 민 폴리머, 제41권 제5호, 2017년 감도가 증가된 10 μm급 패턴이 형성됨을 확인한 바 있다.…”
Section: 서 론unclassified