Photonic Nanostructures Patterned by Thermal Nanoimprint Directly into Organo‐Metal Halide Perovskites

Pourdavoud, Neda; Wang, Si; Mayer, André; Hu, Ting; Chen, Yiwang; Marianovich, André; Kowalsky, Wolfgang; Heiderhoff, R.; Scheer, Hella-Christin; Riedl, Thomas

doi:10.1002/adma.201605003

Cited by 188 publications

(201 citation statements)

References 34 publications

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“…3(b). We are confident that a further material optimization and/or a lowering of the thresholds -for example by post-structuring of the perovskite layers [29] -will eliminate the halide segregation and prevent the wavelength shift in future perovskite devices for lasing applications.…”

Section: Ase Thresholds and Stabilitymentioning

confidence: 99%

“…Most of the following work on perovskite thin films concentrated on the workhorse composition for solar cells, methylammonium (CH 3 NH 3 /MA) lead (Pb) triiodide (I 3 ) that emits around 790 nm. Random lasers [18], whispering gallery mode lasers [19][20][21][22], distributed feedback lasers [23][24][25], vertical cavity lasers [26,27] and photonic crystals lasers have been demonstrated using this CH 3 NH 3 PbI 3 composition [28,29].…”

Section: Introductionmentioning

confidence: 99%

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Triple cation mixed-halide perovskites for tunable lasers

Brenner¹,

Glöckler²,

Rueda-Delgado³

et al. 2017

Opt. Mater. Express

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Metal halide perovskites are recently attracting strong attention due to their potential in solar cells, LEDs, and lasers. Here, we demonstrate the broad spectral tuning of the optical gain characteristics of triple cation (containing methylammonium, formamidinium and cesium) mixed-halide perovskite thin films. We explicitly study the interrelation between amplified spontaneous emission (ASE) thresholds, the operational stability of the gain, and the material composition. The incorporation of cesium and a deficiency of lead in the precursor solutions is found to be crucial for low ASE thresholds and the improved stability of mixed-halide perovskites. We tune the photoluminescence in mixed-halide perovskites between peak wavelengths of 510 and 790 nm by exchanging the halide from iodide to bromide and chloride in small steps of 10%, while preserving the narrowband emission below a linewidth of 130 meV for all mixtures. The optical gain under ns-excitation can be tuned over a significant portion of this spectral window; we observe ASE emission in regions between 545 to 555 nm and 680 to 810 nm. This is a significant step towards perovskite lasers operating through a broad portion of the visible to near infrared spectrum. References and links1. S. Kazim, M. K. Nazeeruddin, M. Grätzel, and S. Ahmad, "Perovskite as Light Harvester: A Game Changer in Photovoltaics," Angew. Chem. Int. Ed. Engl. 53(11), 2812-2824 (2014). 2. S. D. Stranks and H. J. Snaith, "Metal-halide perovskites for photovoltaic and light-emitting devices," Nat.Nanotechnol. 10(5), 391-402 (2015). Tress, A. Abate, A. Hagfeldt, and M. Grätzel, "Cesium-containing triple cation perovskite solar cells: improved stability, reproducibility and high efficiency," Energy Environ. Sci. 9(6), 1989-1997 (2016

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Section: Ase Thresholds and Stabilitymentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Triple cation mixed-halide perovskites for tunable lasers

Brenner¹,

Glöckler²,

Rueda-Delgado³

et al. 2017

Opt. Mater. Express

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“…[1,2] Rapid progress was also demonstrated in the field of light emitting diodes and lasers. [17,18] The comprehensive www.advmattechnol.de attractive for photonic integrated systems. [6,7] Such films have been incorporated into a variety of optical cavities, including whispering gallery mode cavities, [5,[8][9][10] vertical cavities, [4,11] distributed feedback (DFB) cavities, [12][13][14][15][16] and photonic crystal cavities.…”

Section: Introductionmentioning

confidence: 99%

“…[18,[35][36][37] The later approach enables the patterning of perovskite films by directly imprinting a mold into the material at elevated temperatures. [18,[35][36][37] The later approach enables the patterning of perovskite films by directly imprinting a mold into the material at elevated temperatures.…”

Section: Introductionmentioning

confidence: 99%

Micro Lasers by Scalable Lithography of Metal‐Halide Perovskites

Bar‐On

Brenner

Lemmer

et al. 2018

Adv Materials Technologies

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description of the efforts on developing perovskite lasers is given in recent review articles. [19][20][21][22] As the field advances, new approaches for patterning perovskite films are becoming essential. More specifically, a lithographic approach that can define desired perovskite patterns is highly needed in order to utilize these materials for the realization of integrated perovskite photonic devices. Generally speaking, effective lithographic patterning requires three main capabilities. First, the ability to cover the material (in our case perovskites) with a layer of resist and pattern it with sub-micrometer resolution using a scalable process. Second, employment of the patterned resist as an etch mask for complete removal of the unprotected perovskite film. Third, removal of the residual resist mask from the perovskite film. Since metal halide perovskites are unstable soluble materials that are sensitive to a variety of solvents and gases, [23] accomplishing all of the above steps without damaging the film is highly challenging. During the past few years, several attempts have been made in order to address this challenge. Lyashenko et al. [24] demonstrated the ability to pattern perovskites using photolithography followed by SF 6 etching. This approach was utilized to define patterns in photoresists on top of methyl-ammonium lead iodide (MAPbI 3 ) films but was limited to micrometer scale features due to diffraction effects in photolithography. In addition, the chemical reaction that was used in order to etch the material only modified the exposed areas chemically (converting the material to PbF 2 ) and did not remove the perovskite layer completely as desired from a proper etching technique. Zhang et al. [25] demonstrated a different approach where PMMA layers were deposited on top of a MAPbBr 3 film and patterned using electron beam lithography (EBL) followed by dry Cl etching. Although this method can potentially generate sub-micrometer features, it is based on a serial patterning technique (EBL) and is thus limited in terms of speed and cost. In addition, the scanning electron microscopy (SEM) images of the patterned surface suggest that the etching process left a residual layer on the surface (possibly PbCl 2 ) and was unable to remove the perovskite completely. A slightly different approach to pattern perovskite films, involving lift-off instead of etching, was recently successfully demonstrated. [26] However, this technique necessitates the evaporation of perovskite films and is not compatible with the standard spin-coating film preparation method which is simple, inexpensive, and renders these materials A complete lithographic scheme for thin metal halide perovskite films is demonstrated and utilized for the realization of perovskite micro lasers. The process consists of nanoimprint lithography followed by ion beam milling. It is simple, fast, scalable, and exhibits sub-micrometer resolution. The optical properties of the perovskite films are obtained by employing analytical tools as well as by cha...

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“…The reason for the moderate thresholds most likely arise from the surface roughness of perovskite thin films, which scatter the laser mode in the DFB resonators, leading to high losses. Lower threshold thin film perovskite DFB lasers have been recently demonstrated in a 2D photonic crystal laser (threshold of 3.8 µJ/cm 2 ), which can be obtained by patterning and flattening the perovskite layer with a thermal nanoimprint process [23].…”

Section: Introductionmentioning

confidence: 99%

Random lasing in uniform perovskite thin films

Safdar¹,

Wang²,

Krauss³

2017

Opt. Express

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Article:Safdar, Amna, Wang, Yue orcid.org/0000-0002-2482-005X and Krauss, Thomas F. orcid.org/0000-0003-4367-6601 (2018) Random lasing in uniform perovskite thin films. Optics Express. A75-A84. ISSN 1094-4087 https://doi.org/10.1364/OE.26.000A75eprints@whiterose.ac.uk https://eprints.whiterose.ac.uk/ Reuse Items deposited in White Rose Research Online are protected by copyright, with all rights reserved unless indicated otherwise. They may be downloaded and/or printed for private study, or other acts as permitted by national copyright laws. The publisher or other rights holders may allow further reproduction and re-use of the full text version. This is indicated by the licence information on the White Rose Research Online record for the item. TakedownIf you consider content in White Rose Research Online to be in breach of UK law, please notify us by emailing eprints@whiterose.ac.uk including the URL of the record and the reason for the withdrawal request. Abstract: Following the very promising results obtained by the solar cell community, metal halide perovskite materials are increasingly attracting the attention of other optoelectronics researchers, especially for light emission applications. Lasing with both engineered and selfassembled resonator structures, such as microcrystal networks, has now been successfully observed, with the low cost and the simple solution-based process being a particular attraction. The ultimate in simplicity, however, would be to observe lasing from a continuous thin film, which has not been reported yet. Here, we show random lasing action from such a simple perovskite layer. Our lasers work at room temperature; they are deposited on unpatterned glass substrates and they exhibit a minimum threshold value of 10 µJ/cm 2 . By carefully controlling the solution processing conditions, we can determine whether random lasing occurs or not, using identical precursors. A rather special feature is that some of the films exhibit single and dual mode lasing action, which is rarely observed in random lasers. Our work fully exploits the simplicity of the solution-based process and thereby adds an important capability into the emerging field of perovskite-based light emitters. Heiss, and M. V. Kovalenko, "Low-threshold amplified spontaneous emission and lasing from colloidal nanocrystals of caesium lead halide perovskites," Nat. Commun. 6, 8056-8064 (2015). 12. J. Xing, F. Yan, Y. Zhao, S. Chen, H. Yu, Q. Zhang, R. Zeng, H. V. Demir, X. Sun, A. Huan, and Q. Xiong, "High-Efficiency Light-Emitting Diodes of Organometal Halide Perovskite Amorphous Nanoparticles," ACS Nano 10(7), 6623-6630 (2016). Brenner, M. Stulz, D. Kapp, and T. Abzieher, "Highly stable solution processed metal-halide perovskite lasers on nanoimprinted distributed feedback structures," Appl. Random lasing in uniform perovskite

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Photonic Nanostructures Patterned by Thermal Nanoimprint Directly into Organo‐Metal Halide Perovskites

Cited by 188 publications

References 34 publications

Triple cation mixed-halide perovskites for tunable lasers

Triple cation mixed-halide perovskites for tunable lasers

Micro Lasers by Scalable Lithography of Metal‐Halide Perovskites

Random lasing in uniform perovskite thin films

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