2019
DOI: 10.1002/slct.201803318
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Photolysis of PCl3/POCl3 with Oxygen Dopant Using 193 nm ArF Excimer at Low Temperatures: Oxygen Insertion through ‘Phosphadioxirane’ Pathway

Abstract: Photolysis was performed on PCl 3 and POCl 3 in the presence of oxygen dopant in Ar matrix at low temperatures using 193 nm ArF excimer laser. The photo irradiation initially facilitated the formation of ozone in situ in the low temperature matrix. For PCl 3 + O 2 photolysis with 193 nm ArF excimer, initially POCl 3 was produced and subsequent oxygen atom insertion on POCl 3 generated PO 2 Cl 3 . Furthermore, secondary reaction channel opens up in PCl 3 + O 2 photolysis to form a variety of photoproducts such … Show more

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