1993
DOI: 10.1063/1.354143
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Photoluminescence properties of N-implanted Al0.30Ga0.70As0.62P0.38 alloy grown on GaAs0.61P0.39 substrates

Abstract: Luminescence data are presented on nitrogen-implanted Al0.30Ga0.70As0.62P0.38 epitaxial layers, which are grown on GaAs0.61P0.39 substrates by liquid-phase epitaxy, with different annealing temperatures by the rapid thermal annealing technique. Except for the four emission peaks observed from undoped AlGaAsP layers, involving near-band-to-band, donor-to-valence-band, conduction-band-to-acceptor, and donor-acceptor-pair transitions, we also observe the recombinations from the NΓ, N′Γ, and Nx states associated w… Show more

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