Abstract:InGaN single-crystal films were grown on (0001) plane sapphire substrates at 800 °C by metalorganic vapor phase epitaxy. By using such a high temperature for growth, the crystalline quality has been greatly improved. But a high nitrogen over pressure and high indium source flow rate were necessary to achieve significant indium incorporation during growth. For the first time, photoluminescence has been observed in InGaN, and near-band edge emission is seen in the photoluminescence at 77 K. From this photolumine… Show more
“…Absolute In content at such growth method may be also changed by TMIn/TMGa ratio. For the investigated regimes it even stronger influence indium content than growth temperature (fig 1) which is in a good agreement with results of other works (Bedair et al, 1997;Schenk et al, 1999;Yoshimoto et al, 1991 ).…”
“…Absolute In content at such growth method may be also changed by TMIn/TMGa ratio. For the investigated regimes it even stronger influence indium content than growth temperature (fig 1) which is in a good agreement with results of other works (Bedair et al, 1997;Schenk et al, 1999;Yoshimoto et al, 1991 ).…”
“…A large difference between solid composition and vapor phase composition were reported when high-quality InGaN layers were grown at 800 C by MOVPE. 40) All the InGaN layers with various solid compositions grown at 550 C in this study have sufficiently good crystalline quality to emit strong PL at 77 K, which will be shown later in this section. The easy control of InGaN solid composition is another advantage of the RF-MBE growth method.…”
Section: Ingan Growth and Characterizationmentioning
“…The conditions resulted in 2D epitaxial growth at rates of 1-2 µm/hr. InGaN growth was conducted in a manner similar to Yoshimoto at temperatures from 725°C to 800°C [12].…”
Section: Methodsmentioning
confidence: 99%
“…While a ratio of TMI to TMGa of 10 is necessary to achieve the desired InGaN alloy compositions, it is possible to directly deposit high quality InGaN by MOVPE [12]. Using these methods, blue and green LED's have been commercially produced by MOVPE [5].…”
A systematic study of the growth and doping of GaN, AlGaN, and InGaN by both molecular beam epitaxy (MBE) and metal-organic vapor phase epitaxy (MOVPE) has been performed. Critical differences between the resulting epitaxy are observed in the p-type doping using magnesium as the acceptor species. MBE growth, using rf-plasma sources to generate the active nitrogen species for growth, has been used for III-Nitride compounds doped either n-type with silicon or p-type with magnesium. Blue and violet light emitting diode (LED) test structures were fabricated. These vertical devices required a relatively high forward current and exhibited high leakage currents. This behavior was attributed to parallel shorting mechanisms along the dislocations in MBE grown layers. For comparison, similar devices were fabricated using a single wafer vertical flow MOVPE reactor and ammonia as the active nitrogen species. MOVPE grown blue LEDs exhibited excellent forward device characteristics and a high reverse breakdown voltage. We feel that the excess hydrogen, which is present on the GaN surface due to the dissociation of ammonia in MOVPE, acts to passivate the dislocations and eliminate parallel shorting for vertical device structures. These findings support the widespread acceptance of MOVPE, rather than MBE, as the epitaxial growth technique of choice for III-V nitride materials used in vertical transport bipolar devices for optoelectronic applications.
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