2020
DOI: 10.1364/oe.395013
|View full text |Cite
|
Sign up to set email alerts
|

Photolithography allows high-Q AlN microresonators for near octave-spanning frequency comb and harmonic generation

Abstract: Single-crystal aluminum nitride (AlN) possessing both strong Pockels and Kerr nonlinear optical effects as well as a very large band gap is a fascinating optical platform for integrated nonlinear optics. In this work, fully etched AlN-on-sapphire microresonators with a high-Q of 2.1 × 106 for the TE00 mode are firstly demonstrated with the standard photolithography technique. A near octave-spanning Kerr frequency comb ranging from 1100 to 2150 nm is generated at an on-chip power of 406 mW for the TM00 mode. Du… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1

Citation Types

0
13
0

Year Published

2021
2021
2023
2023

Publication Types

Select...
7

Relationship

3
4

Authors

Journals

citations
Cited by 22 publications
(17 citation statements)
references
References 46 publications
0
13
0
Order By: Relevance
“…Figure 1 illustrates the device characterization and the approach taken in this work. Using standard photolithography and inductively coupled plasma etching processes [39], we fabricated the devices in a quarter of a 2 inch wafer, as shown in Fig. 1(b), that consists of a 1.2-μm-thick epitaxial single-crystal AlN film and a sapphire substrate [40].…”
Section: Device Characterization and Principlementioning
confidence: 99%
See 1 more Smart Citation
“…Figure 1 illustrates the device characterization and the approach taken in this work. Using standard photolithography and inductively coupled plasma etching processes [39], we fabricated the devices in a quarter of a 2 inch wafer, as shown in Fig. 1(b), that consists of a 1.2-μm-thick epitaxial single-crystal AlN film and a sapphire substrate [40].…”
Section: Device Characterization and Principlementioning
confidence: 99%
“…Using standard photolithography and inductively coupled plasma etching processes (see in methods), we fabricated devices in a quarter of a 2 inch wafer (Fig. 1b), that consists of a 1.2-μm-thick epitaxial single-crystal AlN film and a sapphire substrate 38,39 . In this work, we employed a microring resonator with a radius of 60 μm, a waveguide width of 2.29 μm (Fig.…”
Section: Device Design Characterization and Techniquementioning
confidence: 99%
“…The TM00 mode has large anomalous dispersion profiles at ~2.3 μm. The desired dispersion of the TE10 and TM00 modes with a short-wavelength DW is achieved for relatively wider resonators, which have been experimentally used for an octave-spanning comb generations [21], [22].…”
Section: Resonance Characteristics Of the Microresonatormentioning
confidence: 99%
“…The dips near 1350 nm in the comb profiles results from the antiphase-matched frequencies [34] because of the pulley coupling, which was demonstrated to improve the extraction efficiency of the microcombs at short wavelength compared to the straight coupling. Moreover, a wider coupling gap G of 600 nm was utilized to increase the coupling efficiency at longer wavelength [33]. Therefore, the PSCs spectra obtained from resonator 2 are wider than the others presented in this work.…”
mentioning
confidence: 94%
“…1(a) shows, the PSCs with various soliton numbers are excited in different AlN MRRs, coupled with straight or pulley waveguide. The MRRs are patterned from an AlN-on-sapphire wafer (AlN thickness1.2 μm) via standard photolithography and inductively coupled plasma etching processes [33]. All the resonators employed in this work have a radius of 60 μm and a cross section of 2.29×1.2 μm 2 (fully etched), which were designed to ensure a low anomalous dispersion (D2/2π = 4.8 MHz) of the target fundamental transverse electrical (TE00) mode [32].…”
mentioning
confidence: 99%