1997
DOI: 10.1016/s0040-4020(97)00154-3
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Photolabile protecting groups for nucleosides: Synthesis and photodeprotection rates

Abstract: o-Nitrobenzyloxycarbonyl and a number of related groups have been tested for the photolabile protection of nucleoside 5'-hydroxyls. The rates of photodeprotection were found to vary by approximately 17-fold in a series of 5'-O-protected thymidine derivatives irradiated at 365 nm under identical conditions. The homologous 2-(o-nitrophenyl)ethoxycarbonyl group and its derivatives were found to be removed approximately 2-fold faster than the corresponding o-nitrobenzyloxycarbonyl group, possibly due to an increas… Show more

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Cited by 165 publications
(136 citation statements)
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References 33 publications
(15 reference statements)
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“…[15,16] It is of the onitrobenzyl-type in which cleavage occurs at the benzylic carbon and the leaving moiety is an aromatic o-nitrosocarbonyl compound. [17] In photoremovable protecting groups involving the 2-(2-nitrophenyl)propoxycarbonyl (NPPOC) group, which was introduced by Pfleiderer and co-workers, [18][19][20] cleavage is due to b elimination, and formation of the reactive and problematic nitroso byproduct [21] can be suppressed by using suitable reaction conditions (Scheme 1). [22] This is probably the reason why chips of higher quality result when using the NPPOC group.…”
Section: Introductionmentioning
confidence: 99%
“…[15,16] It is of the onitrobenzyl-type in which cleavage occurs at the benzylic carbon and the leaving moiety is an aromatic o-nitrosocarbonyl compound. [17] In photoremovable protecting groups involving the 2-(2-nitrophenyl)propoxycarbonyl (NPPOC) group, which was introduced by Pfleiderer and co-workers, [18][19][20] cleavage is due to b elimination, and formation of the reactive and problematic nitroso byproduct [21] can be suppressed by using suitable reaction conditions (Scheme 1). [22] This is probably the reason why chips of higher quality result when using the NPPOC group.…”
Section: Introductionmentioning
confidence: 99%
“…Among the photolabile protecting groups currently in use for photolithographic DNA-chip synthesis [13], the [2-(2-nitrophenyl)propoxy]carbonyl (nppoc) group (1) developed by Pfleiderer and co-workers is a prominent example [14] [15]. It reacts in excellent yield and gives rise to a good quantum yield, the only draw-back for a higher light sensitivity being its low absorption coefficient in the near UV, where illumination is usually performed with the 366-nm Hg line.…”
mentioning
confidence: 99%
“…The caged thymidine 7 was derived from 2 according to [14]. Compound 2 was treated with phosgene, and the resulting chloroformate was allowed to react with thymidine, which afforded the 5'-O-protected derivative 7.…”
mentioning
confidence: 99%
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“…For example, the nitroveratroyloxycarbonyl (NVOC), which contains two methoxy substituents on the NBOC aromatic ring, is known to photocleave ∼15% faster than the NBOC group. 48 Photocleavable Star Polymers to Linear Polymers. As described above in Scheme 1B, photodegradable MNs can also be prepared by cross-linking of functional star MACs with small molecules.…”
Section: Resultsmentioning
confidence: 99%