Photoinhibition of Pitting on Nickel and Alloy CDA 715 in Buffered Chloride-Containing Solutions

Macdonald, Digby D.; Brookes, H. C.; Urquidi‐Macdonald, Mirna; Vázquez, M.

doi:10.5006/1.3283996

Cited by 10 publications

(13 citation statements)

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“…The electrochemistry of copper is used as a model with broad technological applications. − In particular, the dissolution of copper and their alloys have generated much scientific interest because of corrosion and important practical applications such as electropolishing. − Taking advantage of the fact that motional resistance provides information about the electrode|solution interface, we expect the evolution of passive layers to be reflected in changes in motional resistance during copper dissolution. In this work, we discuss the evolution of motional resistance during copper dissolution in diluted sulfuric aqueous solution.…”

Section: Introductionmentioning

confidence: 99%

Motional Resistance Evaluation of the Quartz Crystal Microbalance to Study the Formation of a Passive Layer in the Interfacial Region of a Copper|Diluted Sulfuric Solution

et al. 2015

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A hyphenated technique based on vis–NIR spectroscopy and electrochemical quartz crystal microbalance with motional resistance monitoring was employed to investigate the dissolution of copper in acid media. Changes in motional resistance, current, mass, and absorbance during copper dissolution allow the evolution of the interfacial region of copper|diluted sulfuric solution to be understood. In particular, motional resistance is presented in this work as a useful tool to observe the evolution of the passive layer at the interface. During the forced copper electrodissolution in sulfuric solution, SO4(2–) favors the formation of soluble [Cu(H2O)6]2+. On the contrary, OH– involves the formation of Cu(H2O)4(OH)2, which precipitates on the electrode surface. The high viscosity and density of Cu(H2O)4(OH)2 formed on surface causes an increase in motional resistance independently of resonance frequency changes. During the copper corrosion in a more natural acidic environment, the results of electrochemical impedance spectra at open circuit potential indicate that corrosion is controlled by the diffusion of copper to the solution at short experimental times. However, copper diffusion is hindered by the formation of a passive layer on the electrode surface at long experimental times. During the copper corrosion, motional resistance shows an oscillatory response because of an oscillatory formation/dissolution of the passive later. Vis–NIR spectroscopy and electrochemical quartz crystal microbalance with motional resistance monitoring give new perspectives for reaching a deep understanding of metal corrosion processes and, in a future, other interfacial processes such as the catalysis or adsorption of (bio)molecules.

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Section: Introductionmentioning

confidence: 99%

Motional Resistance Evaluation of the Quartz Crystal Microbalance to Study the Formation of a Passive Layer in the Interfacial Region of a Copper|Diluted Sulfuric Solution

et al. 2015

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“…The incubation time of pit initiation was increased with the use of light of intensity between 0 and 300 mW/cm 2 . In a similar manner, the pitting potentials of metals such as pure iron, 9) 316 stainless steel, 10) 304 stainless steel, 11) iron alloy, 12) copper alloy 13) and copper-nickel alloy 14) became positive under tungsten lamp irradiation. Notably, UV irradiation contributed more to generating a passive film on 304 stainless steel than increasing the pitting potential of the metal.…”

Section: Introductionmentioning

confidence: 78%

Effect of Ultraviolet Light Irradiation on Structure and Electrochemical Properties of Iron Surface

Nanjo

Deng

Oconer³

et al. 2005

Jpn. J. Appl. Phys.

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The effect of ultraviolet light (UV) irradiation (254 nm, 0.8 mW/cm2) on air-formed oxide films and passivated films on iron was investigated by electrochemical methods and scanning tunneling microscopy (STM), in particular with respect to surface micro/nanostructures and the surface protective property. An as-deposited film appeared uniformly flat after UV irradiation for 2–4 h, which is associated with a decrease in current density. UV irradiation for 1–4 h assisted N-dodecylhydroxamic acid (DHA) molecules to strongly bond to the air-formed oxide film. UV irradiation for 1 h led to the formation of a flat terrace of atomic resolution on a surface passivated at 800 mV for 15 min. However, it was difficult to observe a terrace wider than 3 nm on the passive film irradiated for 4 h.

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“…Bertocci [23], using impedance measurements on bulk Cu 2 O, showed that the charge transfer resistance decreased considerably on illumination of the electrode. In other reports, it has been shown that illumination of Cu-Ni alloys renders the passive layers more resistant to the onset of localised attack [24,25]. In the case of pure zinc, it has been shown that illumination leads to an increase in the corrosion rate in chloride-containing solutions [26,27] and in alkaline solutions [28,29].…”

Section: Introductionmentioning

confidence: 98%

“…There have been reports that irradiation of the passive films formed on zinc, copper and copper -nickel alloys causes changes in the passive behaviour of the electrodes [21][22][23][24][25][26][27][28][29]. For example, Kruger [21] showed that illumination of a copper surface in water with white light reduced considerably the rate of formation of Cu 2 O. Chagas et al [22], on measuring the weight loss of copper in H 2 SO 4 solutions, found that the weight loss of copper was higher under conditions of illumination.…”

Section: Introductionmentioning

confidence: 99%

The electrochemical behaviour of CuZn under conditions of illumination

Rudd

Breslin

2000

Electrochimica Acta

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The influence of UV illumination on the passive behaviour of Cu37Zn in pH 9.2 and 13.0 chloride-containing electrolytes was studied using potentiodynamic polarisation tests, cyclic voltammetry and complex impedance spectroscopy. It was found that UV illumination exerted a slight activating effect on the passive behaviour in the alkaline pH 13.0 solution, with slightly higher passive current densities being recorded under conditions of illumination. A more pronounced UV illumination effect was observed in the pH 9.2 solution. This was characterised by a 4-fold increase in the passive current density, a shift in the breakdown potential by 250 mV in the active direction, a decrease in the charge transfer resistance and an increase in the double layer capacitance. These results are explained in terms of the nature of the passive film on CuZn, which consists of a complex layer involving ZnO · xH 2 O and Cu 2 O/CuO. On illumination, photo-decomposition of the n-type ZnO phase occurs leading to a modification of the passive layer rendering it more susceptible to pitting attack in the chloride environments.

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Photoinhibition of Pitting on Nickel and Alloy CDA 715 in Buffered Chloride-Containing Solutions

Cited by 10 publications

References 1 publication

Motional Resistance Evaluation of the Quartz Crystal Microbalance to Study the Formation of a Passive Layer in the Interfacial Region of a Copper|Diluted Sulfuric Solution

Motional Resistance Evaluation of the Quartz Crystal Microbalance to Study the Formation of a Passive Layer in the Interfacial Region of a Copper|Diluted Sulfuric Solution

Effect of Ultraviolet Light Irradiation on Structure and Electrochemical Properties of Iron Surface

The electrochemical behaviour of CuZn under conditions of illumination

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