“…Optical instrumentation development for advanced characterization, fabrication, Materials modeling and rigorous numerical simulations, and Optimization and functionalization of devices via computer aided design Some of the leading equipments that are used to achieve this target are Near-field scanning optical microscope, Con-focal Raman microscope, Nanolithography, Ultra-fast transient absorption spectroscopy, Ultra-fast microscope, Chemical vapor deposition, Chemical synthesis, Atomic force and Scanning tunneling microscopy, Size-selected cluster facility and cluster-based nanomaterials for nanophotonics and nano(photo) catalysis (Sharma et al, 2005). Nanosphere lithography provides a very simple yet powerful way to fabricate nanoparticle arrays with precise control over size, shape and inter-particle spacing that is employed to fabricate sensors.…”