2015
DOI: 10.1016/j.polymer.2015.01.070
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Photoinduced atom transfer radical polymerization in a polar solvent to synthesize a water-soluble poly(2-methacryloyloxyethyl phosphorylcholine) and its block-type copolymers

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Cited by 25 publications
(16 citation statements)
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References 38 publications
(22 reference statements)
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“…Methyl methacrylate was predominantly polymerized in DMF, [23,58,75,77,79] and rarely in DMSO, [74,77] anisole, [24,74,77] acetonitrile, [56] methanol, [21,81]…”
Section: Influence Of the Light Source In Photoatrpmentioning
confidence: 99%
“…Methyl methacrylate was predominantly polymerized in DMF, [23,58,75,77,79] and rarely in DMSO, [74,77] anisole, [24,74,77] acetonitrile, [56] methanol, [21,81]…”
Section: Influence Of the Light Source In Photoatrpmentioning
confidence: 99%
“…To expand these approaches to particular applications where the reactions need to be conducted at low temperatures (e.g., polymerization of monomers with low ceiling temperatures or biochemical applications), 132 a photoinduced radical polymerization process becomes an excellent candidate. 83,[133][134][135] Many works have recently been reported in this field such as photo-ATRP 69,70,75,78,80,84,[86][87][88]110,132,[136][137][138][139][140][141][142][143][144][145][146][147][148][149][150][151][152][153] or photo-RAFT. [72][73][74]76,85, The CuCs-based PISs proposed so far are capable of initiating photo-ATRP.…”
Section: Copper Complexes As Photoinitiators Of Controlled Radical Pomentioning
confidence: 99%
“…Furthermore, this process can become "photo-controlled" at low copper loading providing temporal control allowing for the polymerization to be essentially turned on and off via toggling UV-irradiation. [28][29][30] Herein, for the first time, we present a new PISA system based on PhotoATRP. The PhotoATR-PISA method described simplifies traditional PISA approaches via performing all synthetic steps, from solvophilic POEGMA macroinitiator synthesis to PISA to CCL of hydrophobic PGMA cores, in one-pot without any work-up between steps (Scheme 1).…”
Section: Introductionmentioning
confidence: 99%