Using first-principles calculations we show that the work function of noble metals can be decreased or increased by up to 2 eV upon the adsorption of self-assembled monolayers of organic molecules. We identify the contributions to these changes for several (fluorinated) thiolate molecules adsorbed on Ag(111), Au(111) and Pt(111) surfaces. The work function of the clean metal surfaces increases in this order, but adsorption of the monolayers reverses the order completely. Bonds between the thiolate molecules and the metal surfaces generate an interface dipole, whose size is a function of the metal, but it is relatively independent of the molecules. The molecular and bond dipoles can then be added to determine the overall work function. PACS numbers: 73.30.+y, Recent advances in molecular electronics, where organic molecules constitute active materials in electronic devices, have created a large interest in metal organic interfaces [1]. Transport of charge carriers across the interfaces between metal electrodes and the organic material often determines the performance of a device [2]. Organic semiconductors differ from inorganic ones as they are composed of molecules and intermolecular forces are relatively weak. In a bulk material this increases the importance of electron-phonon and electron-electron interactions [3]. At a metal organic interface the energy barrier for charge carrier injection into the organic material is often determined by the formation of an interface dipole localized at the first molecular layer. The interface dipole can be extracted by monitoring the change in the metal surface work function after deposition of an organic layer [1,4].Atoms and molecules that are physisorbed on a metal surface usually decrease the work function, as the Pauli repulsion between the molecular and surface electrons decreases the surface dipole [5,6]. Chemisorption can give an increase or a decrease of the work function, and can even lead to counterintuitive results [7,8]. Selfassembled monolayers (SAMs) are exemplary systems to study the effect of chemisorbed organic molecules upon metal work functions [9]. More specifically, alkyl thiolate (C n H 2n+1 S) SAMs on the gold (111) surface are among the most extensively studied systems [10,11,12,13,14]. The sulphur atoms of the thiolate molecules form stable bonds to the gold surface and their alkyl tails are close packed, which results in a well ordered monolayer. SAMs with similar structures are formed by alkyl thiolates on a range of other (noble) metal surfaces [10,14,15].Often the change in work function upon adsorption of a SAM is interpreted mainly in terms of the dipole moments of the individual thiolate molecules, whereas only a minor role is attributed to the change induced by chemisorption [9,11,12]. This assumption turns out to be reasonable for adsorption of methyl thiolate (CH 3 S) on Au(111) [13], but for CH 3 S on Cu(111) it is not [14]. In this paper we apply first-principles calculations to study the interface dipoles and the work function change ...