1999
DOI: 10.1016/s0927-0248(99)00044-6
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Photoelectrochemical effect in dye sensitized, sputter deposited Ti oxide films: The role of thickness-dependent roughness and porosity

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Cited by 23 publications
(12 citation statements)
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“…[4,8,38] Thus X-ray diffractometry indicated rutile as well as anatase features, depending on the O 2 /Ar gas flow ratio; the present films had a general preponderance of the rutile phase. Analyses of the widths of the X-ray diffraction peaks indicated a grain size of, roughly, 20 nm.…”
mentioning
confidence: 58%
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“…[4,8,38] Thus X-ray diffractometry indicated rutile as well as anatase features, depending on the O 2 /Ar gas flow ratio; the present films had a general preponderance of the rutile phase. Analyses of the widths of the X-ray diffraction peaks indicated a grain size of, roughly, 20 nm.…”
mentioning
confidence: 58%
“…Applications to photoelectricity and photoelectrocatalysis have given very interesting results. [4,8,38] For example, a 10 mm thick titanium oxide film, prepared as reported in the present paper and dye sensitized by immersion in a solution of cis-dithiocyanatobis(2,2¢-bipyridyl-4,4¢-dicarboxylate)-ruthenium(II) in ethanol, yielded a photoelectric conversion efficiency of about 4 % under exposure to simulated solar irradiation at an intensity of 100 W/m 2 . [39] We note that other efforts have been made recently to produce ªmicrosculpturedº films by glancing angle deposition [40] and to investigate the angular selective optical transmittance through obliquely deposited thin films.…”
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confidence: 78%
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“…Thus research on dye sensitized solar cells incorporating nanoporous TiO 2 films has been done by Gómez et al [79][80][81][82][83][84]. …”
Section: Discussionmentioning
confidence: 99%
“…Recently, reactive sputtering technique has been used to deposit porous TiO 2 thin films with large surface area for the fabrication of DSCs [23][24][25]. Facing target reactive sputtering (FTS) has some added advantages [26,27], such as, achieving good crystallinity at room temperature and deposition of film, free from damage of O − ions and γ-electrons.…”
Section: Introductionmentioning
confidence: 99%