1977
DOI: 10.1016/0014-3057(77)90175-6
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Photodecomposition of commercial polysulphones and model diaryl sulphones

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Cited by 24 publications
(8 citation statements)
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“…For example, facile decomposition of diphenyl sulfone (DPS) has been observed. [53][54][55][56][57] DPS and related compounds decompose via homolytic cleavage of one of the two formally single bonds connecting the sulfur atom to an aromatic ring, a process which characterized by an activation energy of 8.5-8.8 kcal/mol. 57 …”
Section: Degradation In Host Moleculesmentioning
confidence: 99%
“…For example, facile decomposition of diphenyl sulfone (DPS) has been observed. [53][54][55][56][57] DPS and related compounds decompose via homolytic cleavage of one of the two formally single bonds connecting the sulfur atom to an aromatic ring, a process which characterized by an activation energy of 8.5-8.8 kcal/mol. 57 …”
Section: Degradation In Host Moleculesmentioning
confidence: 99%
“…[85][86][87][88][89][90][91][92][93][94][95][96][97] Waksman 85 compares spectral transmittance results with frequently-used solar transmittance values. These materials are frequently studied by visible spectrophotometry.…”
Section: Visible Spectrophotometrymentioning
confidence: 99%
“…Confocal Raman microscopy was also used to demonstrate gradual increase in crystallinity of surface regions of naturally aged polyethylene. 254 13.11 NUCLEAR MAGNETIC RESONANCE 1 H NMR and 13 C NMR spectra 94,95,114,127,131,132,146,150,159,163,179,182,201,208,213,215,217,[255][256][257][258][259][260][261][262][263][264] were used to characterize changes in polysulfones, unsaturated polyester resins, polyurethanes, polyethylene, polyacetal, polystyrene, dyed fibers, and coatings. 252,253 Non-destructive properties of the method are important in these studies.…”
Section: Raman Spectroscopymentioning
confidence: 99%
“…For example, diphenylsulfone (DPSO) has long been known to decompose under UV irradiation via cleavage of the S-C bond. 19,[47][48][49][50][51] Ponterini and Momicchioli presented a detailed study of the triplet decay mechanism for the photodissociation in DPSO using laser flash photolysis, 51 providing a dissociation mechanism of the S-C bond that involves two triplet excited states: a lower energy phenyl-localized 3 * state and a higher lying C-S 3 * state. Excitation to the lowest phenyl 3 * state can be followed by conversion into the 3 * state with a potential energy barrier of ca.…”
Section: Introductionmentioning
confidence: 99%
“…Combined with their high triplet energies, aryl SO 2 and aryl PO derivatives have been used in the development of host materials that inhibit self-quenching of the light-emitting guests in both blue phosphorescent and TADF OLEDs. In addition, such aryl SO 2 and aryl PO-based host materials exhibit good thermal stabilities. Unfortunately, however, some of these materials decompose under UV irradiation or in electrically stressed devices, which limits material lifetime. For example, diphenylsulfone (DPSO) has long been known to decompose under UV irradiation via cleavage of the S–C bond. , Ponterini and Momicchioli presented a detailed study of the triplet decay mechanism for the photodissociation in DPSO using laser flash photolysis, providing a dissociation mechanism of the S–C bond that involves two triplet excited states: a lower energy phenyl-localized 3 ππ* state and a higher lying C–S 3 σσ* state. Excitation to the lowest phenyl 3 ππ* state can be followed by conversion into the 3 σσ* state with a potential energy barrier of ca.…”
Section: Introductionmentioning
confidence: 99%