1982
DOI: 10.1051/rphysap:01982001703011900
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Photocurrent and diffusion lengths at the vicinity of grain boundaries (g.b.) in N and P-type polysilicon. Evaluation of the g.b. recombination velocity)

Abstract: 2014 Les photocourants, les longueurs de diffusion (L) et les vitesses de recombinaison aux joints de grains (s) ont été mesurés à l'aide d'un système de balayage optique sur des échantillons de silicium polycristallin de type N et P. Selon le type des grains, L varie entre 5 03BCm et 150 03BCm et s est supérieur à 104 cm.s-1. Les resultats concernant les mesures locales des longueurs de diffusion montrent qu'au voisinage des joints de grains s'exercent des fortes contraintes. Il semble que les potentiels de b… Show more

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Cited by 25 publications
(6 citation statements)
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“…We performed activation energy measurements on lowly doped n-(2.4 ⋅ 10 16 cm −3 arsenic) and p-type (1.0 ⋅ 10 16 cm −3 boron) polycrystalline silicon layers, finding values of 0.48 eV and 0.26 eV, respectively. The fact that we found the activation energy of n-type polysilicon layers significantly higher than that of similar p-type polysilicon layers, despite their similar structure and doping levels, is consistent with the literature [46]. This is due to the Fermi level being pinned at the grain boundaries closer to the valence band than the conductance band in both n-and p-type polycrystalline silicon, which has been suggested as a major effect of dangling bonds in the formation of depletion-type grain boundaries in both n-and p-type polycrystalline silicon [47].…”
Section: Electrically Active Doping Concentrationsupporting
confidence: 92%
“…We performed activation energy measurements on lowly doped n-(2.4 ⋅ 10 16 cm −3 arsenic) and p-type (1.0 ⋅ 10 16 cm −3 boron) polycrystalline silicon layers, finding values of 0.48 eV and 0.26 eV, respectively. The fact that we found the activation energy of n-type polysilicon layers significantly higher than that of similar p-type polysilicon layers, despite their similar structure and doping levels, is consistent with the literature [46]. This is due to the Fermi level being pinned at the grain boundaries closer to the valence band than the conductance band in both n-and p-type polycrystalline silicon, which has been suggested as a major effect of dangling bonds in the formation of depletion-type grain boundaries in both n-and p-type polycrystalline silicon [47].…”
Section: Electrically Active Doping Concentrationsupporting
confidence: 92%
“…3) The diffusion lengh (L) giving the distance traveled by the photogenerated carriers [37] [38], for a time (τ) that is their lifetime [39] [40] [41], with the diffusion (D) [42] and mobility (μ) [43] coefficients 4) the excess minority carriers recombination that occurs in the volume is associated with the lifetime (τ) and that on the surfaces [44] are called surface recombination velocity, (Se at the n + front, Sf at the junction n + /p, Sb at the rear p/p + , and Sg at the grain joints in the 3D model) [45] [46] [47] [48] [49].…”
Section: Introductionmentioning
confidence: 99%
“…Theoretically, the investigation is done by considering the crystallographic aspect i.e., in a one-dimensional (1D) [29] or three-Dimensional (3D) model of space [30]. The latter case takes into account the grain size (g) and the grains boundaries recombination velocity (Sbg), which influence the shunt resistance [31] [32]. Regardless of the model used [33], the recombination rate at the junction (x = 0) and in the rear (x = H) in the base of the solar cell, is taken into account through, respectively the surfaces recombination velocity Sf and Sb [34] [35] [36].…”
Section: Introductionmentioning
confidence: 99%