The susceptibility of 19 representative per- and polyfluoroalkyl
substances (PFAS) to direct photolysis and defluorination under far-UVC
222 nm irradiation was investigated. Enhanced photolysis occurred
for perfluorocarboxylic acids (PFCAs), fluorotelomer unsaturated carboxylic
acids (FTUCAs), and GenX, compared to that at conventional 254 nm
irradiation on a similar fluence basis, while other PFAS showed minimal
decay. For degradable PFAS, up to 81% of parent compound decay (photolysis
rate constant (k
222 nm) = 8.19–34.76
L·Einstein–1; quantum yield (Φ222 nm) = 0.031–0.158) and up to 31% of defluorination were achieved
within 4 h, and the major transformation products were shorter-chain
PFCAs. Solution pH, dissolved oxygen, carbonate, phosphate, chloride,
and humic acids had mild impacts, while nitrate significantly affected
PFAS photolysis/defluorination at 222 nm. Decarboxylation is a crucial
step of photolytic decay. The slower degradation of short-chain PFCAs
than long-chain ones is related to molar absorptivity and may also
be influenced by chain-length dependent structural factors, such as
differences in pK
a, conformation, and
perfluoroalkyl radical stability. Meanwhile, theoretical calculations
indicated that the widely proposed HF elimination from the alcohol
intermediate (C
n
F2n+1OH) of PFCA is an unlikely degradation pathway due to high
activation barriers. These new findings are useful for further development
of far-UVC technology for PFAS in water treatment.